Methods for producing pattern-forming body

ABSTRACT

A method of producing a pattern-forming body with high accuracy with no need for a post-exposure treatment and without allowing any photocatalyst to remain in the resultant pattern-forming body and whereby any problematic effect of the photocatalyst in the pattern-forming body is eliminated. The method includes providing a photocatalyst-containing layer-sided substrate and a pattern-forming body substrate having a characteristic-changeable layer, which is changed by the effect of the photocatalyst in the photocatalyst-containing layer, and a light-shading part formed as a pattern in such a manner that the photocatalyst-containing layer and the characteristic-changeable layer are brought into contact with each other, followed by exposure on the side of the pattern-forming body substrate to change the characteristics of the characteristic-changeable layer of the exposed part, followed by removing the photocatalyst-containing layer-sided substrate.

BACKGROUND OF THE INVENTION

[0001] The present invention relates to a method for producing apattern-forming body comprising a pattern having differentcharacteristics on the surface that can be used in various applicationssuch as a color filter.

[0002] Various methods for producing pattern-forming bodies havingvarious patterns such as graphics, images, texts and circuits onsubstrates have been proposed.

[0003] For example, when discussing a case of printing as an example, aplanographic plate employed in a planographic printing which is one ofthe printing methods is employed in such a manner that a plate having apattern comprising an ink-receiving lipophilic part and a printingink-repelling part is produced and used to form an image of the ink tobe printed on the lipophilic part and the image thus formed is thentransferred for example onto a paper whereby accomplishing the printing.In such a printing, a pattern such as a text or figure is formed on sucha master printing plate to produce a printing plate as a pattern-formingbody which is then fitted in the printing machine and used. Many typesof the master plates for an offset press which is a representativeplanographic process have been proposed.

[0004] An offset printing plate can be produced by a method in which amaster plate is exposed via a mask on which a pattern was depicted andthen developed or by a method in which an electrophotographic process isemployed to effect a direct exposure whereby making a plate directly onthe master plate. An electrophotographic offset master plate is producedby a method in which a photoconductive layer having a photoconductiveparticle such as zinc oxide and a binder resin as main components areformed on a conductive substrate to form a photosensitive body withwhich the exposure is effected by an electrophotographic process to forma highly lipophilic image on the surface of the photosensitive body,which is then treated with a fat-insensitizing solution to make anon-image part hydrophilic whereby obtaining an offset master plate,i.e., a pattern-forming body. The hydrophilic part is immersed forexample in water to be imparted with a lipophobicity, while a lipophilicimage part receives a printing ink which is then transferred for exampleto a paper. However, various post-exposure treatments for example withfat-insensitizing solutions are required for forming a pattern.

[0005] A method for producing a planographic master plate employing aheat mode recording material capable of forming a pattern comprising ahighly ink-receiving part and an ink-repelling part by means of a laserirradiation has also been proposed. While the heat mode recordingmaterial is advantageous due to the ability of producing a printingplate only by forming an image simply by a laser beam without processesfor example of development, it poses problems associated with adjustmentof the laser intensity, disposal of the residues such as alaser-degenerated solid substance, printing resistance and the like.

[0006] Another known method for forming a highly minute pattern is amethod for producing a pattern-forming body by photolithography whichforms an intended pattern directly by the exposure of a photoresist,involving a process for exposing a photoresist coated on a substratewith a pattern followed by developing the photoresist followed forexample by etching or using a functional substance as a photoresist.

[0007] While a highly minute pattern formation by the photolithographyis employed for example in a method for forming a colored pattern of acolor filter employed in a liquid crystal display, forming a microlens,producing a minute electric circuit board, and producing a chrome maskemployed in exposing a pattern, such a method poses a problem forexample of the waste liquid disposal due to the requirement of thepost-exposure developing with a liquid developer or etching associatedwith the use of a photoresist, as well as a problematic degradation of afunctional substance, if employed as a photoresist, due to alkalinesolution employed for developing.

[0008] Although an attempt is made to form a highly minute pattern of acolor filter and the like by printing, a pattern formed by the printingis problematic with regard to the position accuracy and the like,resulting in a difficulty in forming a pattern at a high accuracy.

[0009] On the other hand, a method for producing a pattern-forming bodyin which a pattern is formed using a substance whose wettability ischanged by the effect of a photocatalyst has been investigated by us forthe purpose of solving the problems described above. Nevertheless, theconventional method for producing a pattern-forming body using aphotocatalyst can not avoid the aspect that the resultantpattern-forming body itself contains the photocatalyst which may affectsome types of the pattern-forming body adversely.

[0010] When forming a pattern using a substance whose wettability ischanged by the effect of a catalyst as described above, the exposureshould be conducted in a pattern usually employing a photomask. However,the exposure via a photomask needs to position the photomask precisely,resulting in a problem associated with the accuracy of the positioningespecially when forming a highly minute pattern. The use of a photomaskmay also require a distance to be provided between the surface of thepattern irradiation target layer whose wettability is changed and thephotomask or may involve other intermediate layers. In such a case, adisadvantage may be experienced in forming a highly minute pattern dueto the scattering of the light irradiated.

SUMMARY OF THE INVENTION

[0011] Accordingly, a method is desired by which a pattern-forming bodycan be produced at a high accuracy with no need of the post-exposuretreatment without allowing any photocatalyst to remain in the resultantpattern-forming body whereby eliminating any problematic effect of thephotocatalyst in the pattern-forming body itself.

[0012] The present invention provides a method for producing apattern-forming body comprising, placing a photocatalyst-containinglayer-sided substrate having a photocatalyst-containing layer containinga photocatalyst and a substrate and a pattern-forming body substratehaving a characteristic-changeable layer whose characteristics arechanged by the effect of the photocatalyst in thephotocatalyst-containing layer and a light-shading part formed as apattern in such a manner that the photocatalyst-containing layer and thecharacteristic-changeable layer are brought into contact with eachother, followed by exposure on the side of the pattern-forming bodysubstrate to change the characteristics of the characteristic-changeablelayer of the exposed part, followed by removing thephotocatalyst-containing layer-sided substrate whereby obtaining apattern-forming body having a pattern whose characteristics have beenchanged on the characteristic-changeable layer.

[0013] In the present invention, since an inventive method forms apattern by changing the characteristics of a characteristic-changeablelayer of an exposed part by effecting the exposure after positioning aphotocatalyst-containing layer in contact with thecharacteristic-changeable layer, as described above, it can produce apattern-forming body having a highly minute pattern whosecharacteristics have been changed without any requirement of thepost-exposure treatments. It also eliminates the problematic sustainedeffect of the photocatalyst in the pattern-forming body since nophotocatalyst is contained in the pattern-forming body itself because ofthe removal of the photocatalyst-containing layer-sided substrate fromthe pattern-forming body after the exposure. Furthermore, apattern-forming body substrate, which is provided with a light-shadingpart which has previously been formed as a pattern, eliminates therequirement of using a photomask when conducting a pattern exposure onthe characteristic-changeable layer, whereby enabling the patternexposure on the characteristic-changeable layer simply by overallexposure on the side of the pattern-forming body substrate. Accordingly,there is no need of a photomask to be provided separately, or ofpositioning with the photomask. As a result, a pattern-forming body canbe formed by a convenient process.

[0014] The present invention also provides a method for producing apattern-forming body comprising, placing a photocatalyst-containinglayer-sided substrate having a photocatalyst-containing layer containinga photocatalyst and a substrate and a pattern-forming body substratehaving a characteristic-changeable layer whose characteristics arechanged by the effect of the photocatalyst in thephotocatalyst-containing layer and a light-shading part formed as apattern in such a manner that the distance between thephotocatalyst-containing layer and the characteristic-changeable layeris 200 μm or less, followed by exposure on the side of thepattern-forming body substrate to change the characteristics of thecharacteristic-changeable layer of the exposed part, followed byremoving the photocatalyst-containing layer-sided substrate wherebyobtaining a pattern-forming body having a pattern whose characteristicshave been changed on the characteristic-changeable layer.

[0015] According to the present invention, by placing thephotocatalyst-containing layer and the characteristic-changeable layerat a certain distance and then exposing, the characteristics of thecharacteristic-changeable layer of an exposed part can efficiently beenchanged to form a pattern, whereby obtaining a pattern-forming bodyhaving a highly minute pattern whose characteristics have been changedwith no need of any particular post-exposure treatment.

[0016] In the present invention, it is preferred that thepattern-forming body substrate comprises a transparent substrate, acharacteristic-changeable layer formed on the transparent substrate, anda light-shading part formed as a pattern. While the invention may notneed a transparent substrate since the characteristic-changeable layeritself has a self supporting property, a material whose sensitivity tothe change in the characteristics is satisfactory is poorlyself-supportive in general, and should frequently be formed as a coatingfilm on a substrate. Accordingly, it is preferable to employ thecharacteristic-changeable layer formed on a transparent substrate asdescribed above.

[0017] In the present invention, it is preferred that the light-shadingpart has been formed as a pattern on the transparent substrate, and iscovered with the characteristic-changeable layer formed thereon. Whilethe place of the light-shading part is not limited particularly, thelight-shading part as a pattern is formed preferably in a place closeras possible to the place where the photocatalyst-containing layer isbrought into contact with the characteristic-changeable layer in orderto improve the accuracy with avoiding the diffused reflection.Accordingly, it is preferred that the light-shading part as a pattern isformed in the place specified above.

[0018] In the present invention, it is preferred that thephotocatalyst-containing layer is a layer consisting of a photocatalyst.When the photocatalyst-containing layer is a layer consisting only of aphotocatalyst, it is possible to improve the efficiency of changing thecharacteristics of the characteristic-changeable layer, whereby enablingan efficient production of a pattern-forming body.

[0019] In the present invention, it is preferred that thephotocatalyst-containing layer is a layer obtained by forming a film ofa photocatalyst on a substrate by means of a vacuum film-forming method.When forming the photocatalyst-containing layer by the vacuumfilm-forming method as described above, it is possible to form aphotocatalyst-containing layer whose surface is less irregular and whichhas a uniform film thickness, whereby enabling a uniform and highlyefficient formation of a pattern whose characteristics in thecharacteristic-changeable layer have been changed.

[0020] On the other hand, in the present invention, it is preferred,that the photocatalyst-containing layer may be a layer having aphotocatalyst and a binder. By using such a binder, it is possible toform the photocatalyst-containing layer in a relatively easier manner,resulting in a less expensive formation of a pattern-forming body.

[0021] In the present invention, it is preferred that the photocatalystis one or more substances selected from the group containing titaniumoxide (TiO₂), zinc oxide (ZnO), tin oxide (SnO₂), strontium titanate(SrTiO₃), tungsten oxide (WO₃), bismuth oxide (Bi₂O₃), and iron oxide(Fe₂O₃), and, among these, titanium oxide (TiO₂) is employed preferablyas a photocatalyst since it is effective as a photocatalyst due to ahigh band gap energy of titanium oxide and it is stable chemical,non-toxic and readily available.

[0022] In the present invention, it is preferred that the exposure iseffected with heating the photocatalyst-containing layer. By conductingthe exposure described above with heating the photocatalyst-containinglayer, it is possible to enhance the effect of the photocatalyst,whereby allowing the exposure to be completed efficiently within a shortperiod.

[0023] In the present invention, it is preferred that the distancebetween the photocatalyst-containing layer and thecharacteristic-changeable layer is within the range from 0.2 μm to 10 μmwhen the photocatalyst-containing layer is placed on the surface of thecharacteristic-changeable layer to effect the exposure. By effecting theexposure with providing a certain short distance as described above, itis possible to change the characteristics of thecharacteristic-changeable layer more effectively.

[0024] In the present invention, it is preferred that thecharacteristic-changeable layer is a layer containing no photocatalyst.By employing as the characteristic-changeable layer a layer containingno photocatalyst, it is possible to avoid a sustained effect of thephotocatalyst regardless of the pattern of the pattern-forming body.

[0025] In the present invention, it is preferred that thecharacteristic-changeable layer is a wettability-changeable layer whosewettability is changed in such a manner that the contact angle with aliquid upon exposure is reduced by the effect of the photocatalystcontained in the photocatalyst-containing layer. By employing as thecharacteristic-changeable layer a wettability-changeable layerundergoing a reduction in the contact angle with a liquid upon exposureas a result of the effect of the photocatalyst, it is possible toutilize the difference in the wettability between the non-exposed partant the exposed part to facilitate the deposition for example of an inkto the exposed pattern, whereby facilitating the formation of afunctional element.

[0026] In the present invention, it is preferred that the contact anglewith a liquid whose surface tension is 40 mN/m on thewettability-changeable layer is 10° or more in a non-exposed part and 9°or less in an exposed part. A contact angle of a non-exposed part of thewettability-changeable layer described above with a liquid less than 10°leads to an insufficient lyophobic performance, while a contact angle ofan exposed part with a liquid of 10° or more leads to a poor spreadingof a functional element composition for the functional part such as anink, resulting in a disadvantageous event such as a color blank in thecase for example that the functional element is a pixel part of a colorfilter.

[0027] In the present invention, it is preferred that thewettability-changeable layer is a layer containing anorganopolysiloxane. In the invention, a wettability-changeable layershould be characterized by the tendency that it exhibits a lyophobicbehavior when being not exposed but becomes lyophilic when being exposedas a result of the effect of a photocatalyst contained in aphotocatalyst-containing layer with which it is in contact. As amaterial which imparts the wettability-changeable layer with such atendency, an organopolysiloxane is employed preferably.

[0028] In the present invention, it is preferred that theorganopolysiloxane is a polysiloxane containing a fluoroalkyl group. Bycontaining such a fluoroalkyl group, it is possible to increase thedifference in the wettability between an exposed part and a non-exposedpart.

[0029] In the present invention, it is preferred that theorganopolysiloxane is an organopolysiloxane which is a hydrolyticcondensate or a hydrolytic co-condensate of one or more siliconcompounds represented by Formula: Y_(n)SiZ_((4−n)), where Y denotesanalkyl group, fluoroalkyl group, vinyl group, amino group, phenylgroup, or epoxy group, X denotes an alkoxyl group or halogen, and ndenotes an integer of 0 to 3. By using such an organopolysiloxane, thecharacteristics in response to the change in the wettability describedabove can be exerted.

[0030] In the present invention, it is possible that the pattern-formingbody substrate has a self supporting wettability-changeable layer onwhose surface a light-shading part formed as a pattern is provided. Awettability-changeable layer which has a self supporting propertyeliminates the necessity of employing a substrate and the like, andallows a pattern-forming body to be formed readily for example by usinga commercially available resin film on whose one side a light-shadingpart has been formed.

[0031] In the present invention, it is preferred that thecharacteristic-changeable layer is a decomposition-removable layer whichis decomposed and removed upon exposure by the effect of thephotocatalyst in the photocatalyst-containing layer. By employing as acharacteristic-changeable layer a decomposition-removable layer which isdecomposed and removed upon exposure by the effect of the photocatalyst,it is possible to form an irregular pattern.

[0032] In the present invention, it is preferred that the contact angleof a liquid with the decomposition-removable layer is different from thecontact angle of a liquid with the transparent substrate which comes outwhen the decomposition-removable layer is decomposed and removed. As aresult of the difference in the contact angle with a liquid between thedecomposition-removable layer and the transparent substrate which comesout after the decomposition and removal, a pattern can be formedutilizing this difference in the wettability.

[0033] In the present invention, it is preferred that thedecomposition-removable layer is either one of a self-assembledmonolayer, Langmuir-Blodgett film or layer-by-layer self-assembled film.By employing such a film as a decomposition-removable layer, a filmhaving a relatively high strength without any defect can readily beformed.

[0034] In the present invention, it is preferred that the wettability onthe transparent substrate is 9° or less as a contact angle with a liquidwhose surface tension being 40 mN/m and that on thedecomposition-removable layer being 10° or more. By adjusting thewettability of a transparent substrate and of a decomposition-removablelayer within the respective ranges specified above, it is possible toimpart the part on which the transparent substrate comes out when thedecomposition-removable layer is decomposed and removed and the part onwhich the decomposition-removable layer is remaining with a lyophobicproperty, whereby facilitating the formation for example of a functionalelement.

[0035] The present invention also provides a pattern-forming bodycomprising, a transparent substrate, a characteristic-changeable layerformed on the transparent substrate whose characteristics are changed bythe effect of a photocatalyst and a light-shading part formed as apattern, and also comprising, a pattern whose characteristics on thecharacteristic-changeable layer have been changed. Since an inventivepattern-forming body has a light-shading part, it eliminates thenecessity of a photomask when being exposed as a pattern in contact witha photocatalyst-containing layer, whereby eliminating the process forpositioning the photomask, resulting in a cost efficient pattern-formingbody.

[0036] In the present invention, it is preferred that light-shading parthas been formed as a pattern on the transparent substrate, and iscovered with the characteristic-changeable layer formed thereon. Sinceit is possible to form a light-shading part as a pattern in a placecloser as possible to the place where the photocatalyst-containing layeris brought into contact with the characteristic-changeable layer asdescribed above, it is possible to prevent a reduction in the patternaccuracy due for example to the energy scattering, whereby enabling theformation of a highly minute pattern-forming body.

[0037] In the present invention it is preferred that thecharacteristic-changeable layer is a wettability-changeable layer whosewettability is changed by the effect of the photocatalyst. By employingas a characteristic-changeable layer such a wettability-changeablelayer, it is possible utilize the difference in the wettability toobtain a pattern-forming body capable of forming a functional elementefficiently.

[0038] In the present invention, it is preferred that the contact anglewith a liquid whose surface tension is 40 mN/m on thewettability-changeable layer is 10° or more in a non-exposed part and 9°or less in an exposed part. Since a non-exposed part is required to havea lyophobic ability and an exposed part is required to be lyophilic asdescribed above, the wettability at a degree specified above isrequired.

[0039] In the present invention, it is preferred that thewettability-changeable layer is a layer containing anorganopolysiloxane, and this organopolysiloxane is preferably apolysiloxane containing a fluoroalkyl group. Such awettability-changeable layer gives a substantial change in thewettability as a result of the exposure when being in contact with aphotocatalyst-containing layer.

[0040] In the present invention, it is preferred that theorganopolysiloxane is an organopolysiloxane which is a hydrolyticcondensate or a hydrolytic co-condensate of one or more siliconcompounds represented by Formula: Y_(n)SiZ_((4−n)), where Y denotes analkyl group, fluoroalkyl group, vinyl group, amino group, phenyl group,or epoxy group, X denotes an alkoxyl group or halogen, and n denotes aninteger of 0 to 3. By forming a wettability-changeable layer using suchan organopolysiloxane as a starting material, it is possible to obtain apattern-forming body on which a wettable pattern having a substantialdifference in the wettability has been formed.

[0041] The present invention also provides a pattern-forming bodycomprising, a self supporting wettability-changeable layer and alight-shading part formed as a pattern on one side of thewettability-changeable layer and also comprising, a pattern comprising alyophilic region and a lyophobic region on the other side of thewettability-changeable layer. Since such a pattern-forming body allows apattern having a different wettability to be obtained only by forming alight-shading part as a pattern on the surface of one side for exampleof a commercially available film followed by exposing while the surfaceof the other side being in contact with a photocatalyst-containinglayer, resulting in a cost efficient pattern-forming body.

[0042] In the present invention, it is preferred that thewettability-changeable layer is a layer containing no photocatalyst,since it is possible to obtain a pattern-forming body avoiding asustained effect of the photocatalyst.

[0043] In the present invention, it is preferred that thecharacteristic-changeable layer is a decomposition-removable layer whichis decomposed and removed by the effect of the photocatalyst. Byemploying as a characteristic-changeable layer a decomposition-removablelayer, it is possible to form an irregular pattern.

[0044] In the present invention, it is preferred that the light-shadingpart has been formed as a pattern on the transparent substrate, and iscovered with the decomposition-removable layer. Since it is possible toform a light-shading part as a pattern in a place closer as possible tothe place where the photocatalyst-containing layer is brought intocontact with the wettability-changeable layer as described above, it ispossible to prevent a reduction in the pattern accuracy due for exampleto the energy scattering, whereby enabling the formation of a highlyminute pattern-forming body.

[0045] In the present invention, it is preferred that the contact angleof a liquid with the decomposition-removable layer is different from thecontact angle of a liquid with the transparent substrate which comes outwhen the decomposition-removable layer is decomposed and removed. As aresult of the difference in the contact angle with a liquid between thedecomposition-removable layer and the transparent substrate which comesout after the decomposition and removal of the decomposition-removablelayer, it is possible to obtain, utilizing this difference in thewettability, a pattern-forming body with which a functional element canreadily be formed.

[0046] In the present invention, it is preferred that thedecomposition-removable layer is either one of a self-assembledmonolayer, Langmuir-Blodgett film, or layer-by-layer self-assembledfilm. As described above, by employing such a film as adecomposition-removable layer, a film having a relatively high strengthwithout any defect can readily be formed.

[0047] In the invention, it is preferred that the wettability on thetransparent substrate is 9° or less as a contact angle with a liquidwhose surface tension being 40 mN/m and that on thedecomposition-removable layer being 10° or more. As described above, byadjusting the wettability of a transparent substrate and of adecomposition-removable layer within the respective ranges specifiedabove, it is possible to impart the part on which the transparentsubstrate comes out which the decomposition-removable layer and the parton which the decomposition-removable layer is remaining with a lyophobicproperty, whereby facilitating the formation for example of a functionalelement.

[0048] The present invention also provides a functional elementcomprising, a functional part positioned along the pattern formed by thechange in the characteristics in a characteristic-changeable layer on atransparent substrate. By using an inventive pattern-forming body asdescribed above, a functional element can readily be obtained.

[0049] In the present invention, a functional element, where thefunctional part is a metal as described above, is provided. This enablesan application for example to a highly minute electric circuitsubstrate.

[0050] In the present invention, a color filter comprising, a pixel partas a functional part of a functional element is provided. Such a colorfilter is of an extremely high quality because of its highly minutepixel part formed therein at a high accuracy. Similarly, the inventionalso provides a microlens comprising, a lens part as a functional partof a functional element. Since this also allows a highly accuratemicrolens to be obtained by a simple process, it is a less expensivemicrolens of a high quality.

BRIEF DESCRIPTION OF THE DRAWINGS

[0051]FIG. 1 is a process diagram indicating an example of the methodfor producing a pattern-forming body of the present invention.

[0052]FIG. 2 is an outlined sectional view indicating an example of apattern-forming body substrate employed in the method for producing apattern-forming body of the present invention.

[0053]FIG. 3 is an outlined sectional view indicating another example ofa pattern-forming body substrate employed in the method for producing apattern-forming body of the present invention.

[0054]FIG. 4 is an outlined sectional view indicating still anotherexample of a pattern-forming body substrate employed in the method forproducing a pattern-forming body of the present invention.

[0055]FIG. 5 is an outlined sectional view indicating an example of thecondition of the contact in the method for producing a pattern-formingbody of the present invention.

[0056]FIGS. 6A to 6C are outlined sectional views illustrating afunctional element of the present invention.

[0057]FIGS. 7A to 7D are outlined sectional views illustrating afunctional element of the present invention.

[0058]FIGS. 8A to 8C are outlined sectional views illustrating anexample of the method for producing a microlens according to the presentinvention.

[0059]FIGS. 9A to 9C are outlined sectional views illustrating afunctional element of the present invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0060] The invention relates to a method for producing a pattern-formingbody and also to a pattern-forming body itself. The invention isdetailed below in sections.

[0061] A. Methods for Producing Pattern-forming Bodies

[0062] A method for producing a pattern-forming body of the presentinvention is detailed below. In a method for producing a pattern-formingbody of the invention, a photocatalyst-containing layer-sided substratehaving a photocatalyst-containing layer containing a photocatalyst and asubstrate and a pattern-forming body substrate having acharacteristic-changeable layer whose characteristics are changed by theeffect of the photocatalyst in the photocatalyst-containing layer and alight-shading part formed as a pattern are exposed on the side of thepattern-forming body substrate with the photocatalyst-containing layerand the characteristic-changeable layer being brought into contact witheach other to change the characteristics of thecharacteristic-changeable layer of the exposed part and then thephotocatalyst-containing layer-sided substrate is removed to obtain apattern-forming body having a pattern whose characteristics have beenchanged on the characteristic-changeable layer.

[0063] As described above, in a method for producing a pattern-formingbody of the present invention, an overall exposure from the side of thecharacteristic-changeable layer with the photocatalyst-containing layerbeing in contact with the characteristic-changeable layer results in thechange in the characteristics of a characteristic-changeable layer of apart exposed by the effect of a photocatalyst in aphotocatalyst-containing layer, whereby yielding a pattern formed by thepart which has been exposed on the characteristic-changeable layer,i.e., the part whose characteristics have been changed. Accordingly, thepattern formation does not need any post-treatments such aspost-exposure developing or washing, allowing a pattern having differentcharacteristics to be obtained by reduced number of manufacturingprocess at a lower cost when compared with conventional methods.Therefore, it is possible to form a functional element such as a colorfilter more readily at a lower cost by forming the functional part along the resultant pattern whose characteristics have been changed.

[0064] Also since in the present invention the photocatalyst-containinglayer-sided substrate is removed to obtain the pattern-forming bodysubstrate as a pattern-forming body after changing the characteristicson the characteristic-changeable layer by the effect of thephotocatalyst in the photocatalyst-containing layer, the resultantpattern-forming body does not necessarily contain the photocatalyst.Accordingly, when the resultant pattern-forming body is imparted with afunctional part to form a functional element, the functional element canavoid any disadvantageous sustained effect of the photocatalyst.

[0065] Also since in the present invention the light-shading part isformed as a pattern on the substrate on the pattern-forming bodysubstrate, an overall exposure on the side of the pattern-forming bodysubstrate allows a pattern having different characteristics to be formedreadily on the characteristic-changeable layer. Accordingly, theinventive method does not require a photomask, which is required in anordinary pattern exposure, or photo-writing and the like. In addition,the possibility of allowing the position where the light-shading part tobe close to the position where the photocatalyst-containing layer is incontact with the characteristic-changeable layer leads to the preventionof any reduction in the accuracy due to the scattering of the energy forexample of the exposing light, whereby yielding a pattern having anextremely high accuracy.

[0066] A method for producing a pattern-forming body of the presentinvention is now discussed with referring to figures. The term “pattern”employed in the present invention is not limited particularly, and maybe any of various pattern including graphics, images, circuits, andtexts.

[0067]FIG. 1 shows an example of the methods for producingpattern-forming bodies according to the present invention. In thisproduction method, a photocatalyst-containing layer-sided substrate 3comprising a substrate 1 and a photocatalyst-containing layer 2 formedon the substrata 1 and a pattern-forming body substrate 7 comprising atransparent substrate 4, a light-shading part 5 formed as a pattern onthis transparent substrate 4, and a characteristic-changeable layer 6formed on this light-shading part 5 are provided (FIG. 1A).

[0068] Then, the photocatalyst-containing layer 2 in thephotocatalyst-containing layer-sided substrate 3 is placed in contactwith the characteristic-changeable layer 6 in the pattern-forming bodysubstrate 7 (FIG. 1B). This contact is not limited to a completely closecontact, and a placement involving a certain distance may be acceptableas described below.

[0069] Under the condition where the photocatalyst-containing layer 2and the characteristic-changeable layer 6 are placed as described above,energy 8 is irradiated on the side of the pattern-forming body substrate7. As a result, the characteristics of the characteristic-changeablelayer 6 of a part where the light-shading part 5 has not been formed arechanged to yield a characteristic-changeable region 10 (FIG. 1C).

[0070] Subsequently, the photocatalyst-containing layer-sided substrate3 is removed (separated) to obtain a pattern-forming body 7′ on whichthe characteristic-changeable region 10 has been formed.

[0071] Employing the production method described above as an example, amethod for producing a pattern-forming body of the present invention isfurther detailed below.

[0072] 1. Photocatalyst-containing Layer-sided Substrate

[0073] A photocatalyst-containing layer-sided substrate employed in thepresent invention is discussed first. A photocatalyst-containinglayer-sided substrate employed in a method for producing apattern-forming body of the invention has at least aphotocatalyst-containing layer and a substrate, and is formed usually byforming a photocatalyst-containing layer as a thin film on a substrateby a certain method. The component-by-component description is madebelow.

[0074] (Photocatalyst-containing Layer)

[0075] A photocatalyst-containing layer employed in the invention is notlimited particularly provided that it allows a photocatalyst containedin the photocatalyst-containing layer to change the characteristics of acharacteristic-changeable layer with which it is brought into contact,and may comprising a photocatalyst and a binder or may be a layer formedas a film only from a photocatalyst itself. The wettability of itssurface may be of lyophilic or it may have a lyophobic surface.

[0076] While the action mechanism of a photocatalyst in aphotocatalyst-containing layer, such as titanium oxide described above,is not known clearly, it is assumed that a carrier generated by theirradiation of a light may reacts directly with a nearby compound or mayyield active oxygen species in the presence of oxygen and water to exertsome effects on the chemical structures of organic compounds. In thepresent invention, such a carrier is assumed to exert some effects oncompounds in the characteristic-changeable layer which is brought intocontact on the photocatalyst-containing layer.

[0077] A photocatalyst employed in the present invention may for examplebe one known as a photosemiconductor such as titanium oxide (TiO₂), zincoxide (ZnO), tin oxide (SnO₂), strontium titanate (SrTiO₃), tungstenoxide (WO₃), bismuth oxide (Bi₂O₃) and iron oxide (Fe₂O₃), any of whichcan be employed alone or in combination with each other.

[0078] In the present invention, a titanium oxide is especiallypreferred since it. has a high band gap energy and is stable chemicallyand non-toxic, and also readily available. Titanium oxides can begrouped into anatase type and rutile type, both of which can be employedin the invention, with a titanium oxide of the anatase type beingpreferred. The excitation wavelength of an anatase titanium oxide is 380nm or less.

[0079] Such an anatase titanium oxide may for example be hydrochloricacid-deswelling anatase-type titania sol (Ishihara Sangyo Kaisha, Ltd.,STS-02 (mean particle size: 7 nm), Ishihara Sangyo Kaisha Ltd., ST-K01),nitric acid-deswelling anatase-type titania sol (Nissan ChemicalIndustries, Ltd., TA-15 (mean particle size: 12 nm) and the like.

[0080] A smaller particle size of a photocatalyst is more preferredbecause of a higher efficiency of the photocatalytic reaction, with amean particle size of 50 nm or less being preferred, 20 nm or less beingparticularly preferred.

[0081] A photocatalyst-containing layer in the present invention may beformed only from a photocatalyst or may be formed from a mixture with abinder.

[0082] In the case of a photocatalyst-containing layer formed only froma photocatalyst, the efficiency in response to the change in thecharacteristics of a characteristic-changeable layer is improved,resulting in an advantageously reduced cost due to a reduced treatmenttime period and the like. On the other hand, a photocatalyst-containinglayer comprising a photocatalyst and a binder is also advantageous sinceit allows the photocatalyst-containing layer to be formed readily.

[0083] A method for producing a photocatalyst-containing layerconsisting only of a photocatalyst may for example be a vacuumfilm-forming method such as a sputtering method, CVD method, vacuumvapor deposition method and the like. By forming aphotocatalyst-containing layer by a vacuum film-forming method, it ispossible to obtain a uniform photocatalyst-containing layer whichcontains only a photocatalyst, which allows the characteristics on acharacteristic-changeable layer to be changed uniformly, and the useonly of the photocatalyst enables a more efficient change in thecharacteristics on the characteristic-changeable layer when compared tothe use in combination with a binder.

[0084] A method for producing a photocatalyst-containing layerconsisting only of a photocatalyst, in the case for example that thephotocatalyst is a titanium oxide, involves the formation of anamorphous titania on a substrate followed by the phase transition to acrystalline titania by calcination. Such an amorphous titania employedhere can be obtained for example by hydrolysis or dehydratingcondensation of an inorganic salt of a titanium such as titaniumtetrachloride and titanium sulfate, or by hydrolysis or dehydratingcondensation of an organic titanium compound such astetraethoxytitanium, tetraisopropoxytitanium, tetra-n-propoxytitanium,tetrabutoxytitanium and tetramethoxytitanium in the presence of an acid.Subsequently, the resultant titania may be sintered at 400 to 500° C. toconvert into an anatase titania or at 600 to 700° C. to convert into anrutile titania.

[0085] When using a binder, a binder having a high binding energysufficient to prevent the decomposition of its backbone by thephotoexcitation of the photocatalyst is preferred, such as anorganopolysiloxane which is detailed below in the section of acharacteristic-changeable layer.

[0086] When such an organopolysiloxane is employed as a binder, aphotocatalyst-containing layer described above can be formed bydispersing a photocatalyst and an organopolysiloxane as a binder ifnecessary together with other additives in a solvent to prepare acoating solution, followed by coating this coating solution on asubstrate. The solvent employed here is preferably an alcoholic solventsuch as ethanol and isopropanol. The coating may be accomplished by aknown coating method such as spin coat, spray coat, dip coat, roll coat,and beads coat. When a component of UV setting type is contained as abinder, a photocatalyst-containing layer can be formed by irradiating aUV ray to effect setting.

[0087] An amorphous silica precursor may be employed also as a binder.Such an amorphous silica precursor is preferably a silicon compoundrepresented by Formula: SiX₄, where X is a halogen, methoxy group,ethoxy group, or acetyl group, a hydrolysate thereof, i.e., silanol, ora polysiloxane whose mean molecular weight is 3000 or less.

[0088] Those mentioned typically are tetraethoxysilane,tetraisopropoxysilane, tetra-n-propoxysilane, tetrabutoxysilane,tetramethoxysilane and the like. In this case, aphotocatalyst-containing layer can be formed by dispersing an amorphoussilica precursor and the particle of a photocatalyst uniformly in anon-aqueous solvent followed by a hydrolysis by water contained in airto form a silanol on a transparent substrate followed by a dehydratingcondensation polymerization at room temperature. By conducting thedehydrating condensation polymerization at 100° C. or higher, thepolymerization degree of the silanol is increased, whereby improving thestrength of the film surface. Each of the binders listed above may beemployed alone or in combination.

[0089] The photocatalyst content in a photocatalyst-containing layerwhen using a binder is 5 to 60% by weight, preferably 20 to 40% byweight. The thickness of the photocatalyst-containing layer ispreferably within the range from 0.05 to 10 μm.

[0090] A photocatalyst-containing layer may contain a surfactant inaddition to a photocatalyst and a binder described above. Thoseexemplified typically are hydrocarbon-based surfactants such as eachseries of NIKKOL BL, BC, BO and BB (Nikko Chemicals Co., Ltd.) andfluorine-based or silicone-based nonionic surfactants such as ZONYL FSNand FSO (Du Pont Kabushiki Kaisha), Surflon S-141 and 145 (Asahi GlassCompany), MEGAFACE-141 and 144 (Dainippon Ink and Chemicals,Incorporated), Ftergent F-200 and F251 (NEOS CORPORATION.), UNIDYNEDS-401 and 402 (DAIKIN INDUSTRIES, Ltd.), FLOLADE FC-170 and 176 (3M)and the like, as well as cationic surfactants, anionic surfactants andzwitterionic surfactants.

[0091] In addition to the surfactants listed above, oligomers andpolymers of polyvinyl alcohols, unsaturated polyesters, acrylic resins,polyethylenes, diallyl phthalate, ethylenepropylenediene monomer, epoxyresins, phenol resins, polyurethane, melamine resins, polycarbonates,polyvinyl chlorides, polyamides, polyimides, styrene-butadiene rubbers,chloroprene rubbers, polypropylenes, polybutylenes, polystyreness,polyvinyl acetates, polyesters, polybutadienes, polybenzimidazoles,polyacrylonitriles, epichlorohydrins, polysulfites, polyisoprenes andthe like may also be contained in a photocatalyst-containing layer.

[0092] (Substrate)

[0093] In present the invention, as shown in FIG. 1A, aphotocatalyst-containing layer-sided substrate 3 has at least asubstrate 1 and a photocatalyst-containing layer 2 formed on thissubstrata 1.

[0094] Since this substrate eliminates the need of transmitting anylight upon exposure as shown also in FIG. 1C, its material is notlimited particularly and may be any material as desired. Nevertheless,since this photocatalyst-containing layer-sided substrate is usedrepetitively in the invention, a material having a certain strengthwhose surface can be in close contact with the photocatalyst-containinglayer is employed preferably.

[0095] Those exemplified typically are glasses, ceramics, metals,plastics and the like.

[0096] For the purpose of improving the close contact between thesurface of a substrate and a photocatalyst-containing layer, a primerlayer may be formed on the substrate. Such a primer layer may forexample be of silane-based and titanium-based coupling agents.

[0097] 2. Pattern-forming Body Substrate

[0098] A pattern-forming body substrate employed in the presentinvention is discussed below. A pattern-forming body substrate employedin the invention is not limited particularly provided that it has atleast a characteristic-changeable layer and a light-shading part formedas a pattern. As shown in FIG. 1A as an example, a transparent substrate4 may has a light-shading part 5 formed thereon, further on which acharacteristic-changeable layer 6 is formed to give a pattern-formingbody substrate 7 (hereinafter referred to as Embodiment 1), or,alternatively as shown in FIG. 2, where the characteristic-changeablelayer has a self supporting property the light-shading part 5 may beformed on the characteristic-changeable layer 6 to give thepattern-forming body substrate 7 (hereinafter referred to as Embodiment2).

[0099] Each embodiment is discussed below separately.

[0100] (1) Embodiment 1

[0101] Embodiment 1 of a pattern-forming body substrate of the presentinvention relates to a pattern-forming body substrate having acharacteristic-changeable layer, a light-shading part, and a transparentsubstrate. Each component is discussed below.

[0102] (Characteristic-changeable Layer)

[0103] A characteristic-changeable layer of this embodiment is discussedfirst. A characteristic-changeable layer of this embodiment is notlimited particularly provided that its characteristics are changed bythe effect of a photocatalyst-containing layer described above. Forexample, the characteristic-changeable layer may be converted to a layerthat can be colored by the effect of the photocatalyst by admixing aphotochromic material such as spiropyran or an organic dye decomposableby the effect of the photocatalyst with the characteristic-changeablelayer.

[0104] It is also possible to use as a characteristic-changeable layer alayer whose adhesiveness to various materials is improved as a result ofthe introduction of a polar group or of the surface condition impartedwith a roughness by the effect of a photocatalyst in an exposed part byusing a polymeric material such as a polyolefin including polyethylenesand polypropylenes. By employing as a characteristic-changeable layer anadhesion-changeable layer whose adhesiveness is changed, a patternhaving a satisfactory adhesiveness can be formed by a pattern exposure.A pattern-forming body having a pattern of such a satisfactorilyadhesive part enables the formation of a metal thin film pattern forexample by depositing a metal component to such a pattern-forming bodyto form a metal thin layer followed by utilizing the difference in theadhesiveness to peel the metal thin film for example by means ofadhesive agents or other reagents. By this method, a metal thin filmpattern can be formed without forming a resist pattern, whereby enablingthe formation of a print board or electronic circuit element whosepattern is further minute when compared with those obtained by aprinting process.

[0105] Also in this embodiment, such a characteristic-changeable layermay be one formed by a dry process, i.e., a vacuum vapor deposition andthe like, or by a wet process, i.e., a spin coat or dip coat process.

[0106] While a characteristic-changeable layer is not limitedparticularly provided that it has various characteristics which arechanged by the effect of a photocatalyst, the following two cases, i.e.,the case where the characteristic-changeable layer is awettability-changeable layer whose wettability is changed by the effectof the photocatalyst to form a wettability-based pattern and the casewhere the characteristic-changeable layer is a decomposition-removablelayer which is decomposed and removed by the effect of the photocatalystto form an irregular pattern are preferred particularly in thisembodiment since they realize the effectiveness of this embodimentespecially in view of the resultant functional elements and the like.

[0107] Such wettability-changeable layer and decomposition-removablelayer are discussed below.

[0108] a. Wettability-changeable Layer

[0109] While a wettability-changeable layer in this embodiment is notlimited particularly provided that it is a layer whose surface undergoesthe change in the wettability by the effect of a photocatalyst describedabove, it is preferably a layer whose wettability is changed in such amanner that the contact angle with a liquid on the surface of thewettability-changeable layer is reduced by the effect of thephotocatalyst upon exposure.

[0110] It should be made from a material enabling the transmission of anenergy capable of activating a photocatalyst in aphotocatalyst-containing layer which is in contact.

[0111] Thus, by employing a wettability-changeable layer whosewettability is changed in such a manner that the contact angle with aliquid is reduced upon exposure (to the irradiation not only with lightbut also with energy in this embodiment), the exposure through thelight-shading part described above allows the wettability to be changedreadily in a pattern whereby forming a pattern of the lyophilic regionwhose contact angle with a liquid is low, to which a composition for thefunctional part is then deposited, whereby allowing a functional elementto be obtained easily. Thus, the functional element can efficiently beproduced, resulting in an advantageous cost efficiency.

[0112] A lyophilic region mentioned here means a region where thecontact angle with a liquid is low, i.e., a region which is readily wetwith a composition for the functional part, including an ink forcoloring a pixel part (colored part) for example when the functionalelement is a color filter and a microlens-forming composition when thefunctional element is a microlens. A lyophobic region means a regionwhere the contact angle with a liquid is high, i.e., a region which ispoorly wet with a composition for the functional part described above.

[0113] In this embodiment, a region is referred to as a lyophilic regionwhen the contact angle with a liquid is lower by 1° or more than thecontact angle with a liquid in the adjacent region, while it is referredto as a lyophobic region when the contact angle with a liquid is higherby 1° or more than the contact angle with a liquid in the adjacentregion.

[0114] A wettability-changeable layer has a wettability in a non-exposedregion, i.e., in a lyophobic region, which gives a contact angle with aliquid whose surface tension is 40 mN/m of 10° or more, preferably acontact angle with a liquid whose surface tension is 30 mN/m of 10° ormore, particularly a contact angle with a liquid whose surface tensionis 20 mN/m of 10° or more. Since a non-exposed part should have alyophobic property in this embodiment, a low contact angle with a liquidresults in an insufficient lyophobic effect, which may lead to aproblematic remaining of a composition for the functional part describedabove.

[0115] A wettability-changeable layer is preferably a layer whichundergoes a reduction in the contact angle with a liquid upon exposureto give a contact angle with a liquid whose surface tension is 40 mN/mof 9° or less, preferably a contact angle with a liquid whose surfacetension is 50 mN/m of 10° or less, particularly a contact angle with aliquid whose surface tension is 60 mN/m of 10° or less. Since a highcontact angle in an exposed part, i.e., a lyophilic region, may lead toa poor spreading of a composition for the functional part in this part,resulting in a problem for example due to defect of the functional part.

[0116] The contact angle with a liquid mentioned here is based on theresults or on a graph from such results obtained by measuring thecontact angles with liquids having various surface tensions (30 secondsafter dropping a liquid from a microsyringe) using a contact anglemeasuring instrument (Kyowa Interface Science Co., LTD., model CA-Z).Liquids having various surface tensions employed in this measurement weemployed were the wettability index standard solutions produced byJUNSEI CHEMICAL CO., LTD.

[0117] Also when using a wettability-changeable layer described above inthis embodiment, this wettability-changeable layer may further containfluorine, and such a wettability-changeable layer has been formed insuch a manner that the fluorine content on the surface of thiswettability-changeable layer is reduced upon exposure of thewettability-changeable layer by the effect of a photocatalyst describedabove when compared with the content before exposure.

[0118] Such characteristics of a wettability-changeable layer allow apattern of a less fluorine content to be formed readily by a patternirradiation of energy. The fluorine employed here has an extremely lowsurface energy, which gives a lower critical surface tension of thesurface of a fluorine-rich substance. Accordingly, the critical surfacetension of a fluorine-poor region becomes greater than the criticalsurface tension of a fluorine-rich surface. This means that thefluorine-poor part becomes a relatively more lyophilic region whencompared with the fluorine-rich part. Therefore, to form a pattern of afluorine-poor part when compared with surrounding surface is to form apattern of a lyophilic region within a lyophobic region.

[0119] Accordingly, when employing such a wettability-changeable layer,a pattern irradiation of energy allows a pattern of a lyophilic regionto be formed readily within a lyophobic region, whereby facilitating theformation of a functional part exclusively within this lyophilic region,resulting in a cost-efficient functional element having a satisfactoryquality.

[0120] The fluorine content of a fluorine-containingwettability-changeable layer described above in a fluorine-poorlyophilic region formed by exposure is 10 or less, preferably 5 or less,more preferably 1 or less, based on 100 as the fluorine content in anon-exposed region.

[0121] A content within the range specified above allows the wettabilityto be different substantially between an exposed part and a non-exposedpart. Accordingly, by forming a functional part in such awettability-changeable layer, it is possible to form the functional partcorrectly only within a lyophilic region whose fluorine content isreduced, whereby enabling a production of a functional element at a highaccuracy. Any reduction in the content mentioned here is based onweight.

[0122] The measurement of the fluorine content of thewettability-changeable layer can be accomplished by various methodsemployed ordinarily, and any method capable of quantifying fluorine on asurface can be employed such as X-ray photoelectron spectroscopy alsoreferred to as ESCA (electron spectroscopy for chemical analysis),fluorescent X-ray analysis, mass spectroscopy and the like.

[0123] While a material employed in such a wettability-changeable layeris not limited particularly provided that it undergoes a change in thecharacteristics of the wettability-changeable layer described above,i.e., the change in the wettability, by the effect of a photocatalyst ina photocatalyst-containing layer which becomes in contact with exposureand also provided that it has a backbone which is not degraded ordecomposed readily by the effect of the photocatalyst, those exemplifiedare (1) an organopolysiloxane which exerts a substantial strengthobtained by hydrolysis or polymerization condensation of chloro- oralkoxysilane in a sol-gel reaction, and (2) an organopolysiloxane suchas an organopolysiloxane crosslinked with a reactive silicone which hasexcellent water-repelling or oil-repelling property.

[0124] A substance (1) described above is preferably anorganopolysiloxane which is a hydrolytic condensate or a hydrolyticco-condensate of one or more silicon compounds represented by Formula:

Y_(n)SiZ_((4−n))

[0125] wherein Y denotes an alkyl group, fluoroalkyl group, vinyl group,amino group, phenyl group or epoxy group, X denotes an alkoxyl group,acetyl group or halogen, and n denotes an integer of 0 to 3. The numberof carbon atoms in a group represented by Y is preferably 1 to 20, andthe alkoxy group represented by X is preferably a methoxy group, ethoxygroup, propoxy group, and butoxy group.

[0126] Those exemplified typically are methyltrichlorosilane,methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane,methyltriisopropoxysilane, methyltri-t-butoxysilane;ethyltrichlorosilane, ethyltribromosilane, ethyltrimehtoxysilane,ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltri-t-butoxysilane;n-propyltrichlorosilane, n-propyltribromosilane,n-propyltrimethoxysilane, n-propyltriethoxysilane,n-propytriisopropoxysilane, n-propyltri-t-butoxysilane;n-hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane,n-hexyltriethoxysilane, n-propytriisopropoxysilane,n-hexyltri-t-butoxysilane; n-decyltrichlorosilane,n-decyltribromosilane, n-decyltrimethoxysilane, n-decyltriethoxysilane,n-decyltriisopropoxysilane, n-decyltri-t-butoxysilane;n-octadecyltrichlorosilane, n-octadecyltribromosilane,n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane,n-octadecyltriisopropoxysilane, n-octadecyltri-t-butoxysilane;phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane,phenyltriethoxysilane, propytriisopropoxysilane,phenyltri-t-butoxysilane; tetrachlorosilane, tetrabromosilane,tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane,dimethoxydiethoxysilane; dimethyldichlorosilane, dimethyldibromosilane,dimethyldimethoxysilane, dimethyldiethoxysilane; diphenyldithlorosilane,diphenyldibromosilane, diphenyldimehtoxysilane, diphenyldiethoxysilane;phenylmethyldichlorosilane, phenylmethyldibromosilane,phenylmethyldimethoxysilane, phenylmethyldiethoxysilane;trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane,triethoxyhydrosilane, triisopropoxyhydrosilane, tri-t-butoxyhydrosilane;vinyltrichlorosilane, vinyltribromosilane, vinyltrimehtoxysilane,vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltri-t-butoxysilane;trifluoropropyltrichlorosilane, trifluoropropyltribromosilane,trifluoropropyltrimehtoxysilane, trifluoropropyltriethoxysilane,trifluoropropyltriisopropoxysilane, trifluoropropyltri-t-butoxysilane;γ-glycidoxypropylmethyldimethoxysilane,γ-glycidoxypropylmethyldiethoxysilane,γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane,γ-glycidoxypropyltriisopropoxysilane,γ-glycidoxypropyltri-t-butoxysilane;γ-methacryloxypropylmethyldimethoxysilane,γ-methacryloxypropylmethyldiethoxysilane,γ-methacryloxypropyltrimethoxysilane,γ-methacryloxypropyltriethoxysilane,γ-methacryloxypropyltriisopropoxysilane,γ-methacryloxypropyltri-t-butoxysilane;γ-aminopropylmethyldimethoxysilane, γ-aminopropylmethyldiethoxysilane,γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane,γ-aminopropyltriisopropoxysilane, γ-aminopropyltri-t-butoxysilane;γ-mercaptopropylmethyldimethoxysilane,γ-mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane,γ-mercaptopropyltriethoxysilane, γ-mercaptopropyltriisopropoxysilane,γ-mercaptopropyltri-t-butoxysilane;β-(3,4-epoxycyclohexy)ethyltrimethoxysilane,β-(3,4-epoxycyclohexy)ethyltriethoxysilane; and partial hydrolysatesthereof as well as mixture thereof.

[0127] A fluoroalkyl group-containing organopolysiloxane is especiallypreferred, and those exemplified typically are hydrolytic condensates orhydrolytic co-condensates of one or more fluoroalkylsilicon compoundslisted below and those known generally as fluorine-based silane couplingagents can be employed.

[0128] CF₃(CF₂)₃CH₂CH₂Si(OCH₃)₃;

[0129] CF₃(CF₂)₅CH₂CH₂Si(OCH₃)₃;

[0130] CF₃(CF₂)₇CH₂CH₂Si(OCH₃)₃;

[0131] CF₃(CF₂)₉CH₂CH₂Si(OCH₃)₃;

[0132] (CF₃)₂CF(CF₂)₄CH₂CH₂Si(OCH₃)₃;

[0133] (CF₃)₂CF(CF₂)₆CH₂CH₂Si(OCH₃)₃;

[0134] (CF₃)₂CF(CF₂)₈CH₂CH₂Si(OCH₃)₃;

[0135] CF₃(C₆H₄)C₂H₄Si(OCH₃)₃;

[0136] CF₃(CF₂)₃(C₆H₄)C₂H₄Si(OCH₃)₃;

[0137] CF₃(CF₂)₅(C₆H₄)C₂H₄Si(OCH₃)₃;

[0138] CF₃(CF₂)₇(C₆H₄)C₂H₄Si(OCH₃)₃;

[0139] CF₃(CF₂)₃CH₂CH₂SiCH₃(OCH₃)₂;

[0140] CF₃(CF₂)₅CH₂CH₂SiCH₃(OCH₃)₂;

[0141] CF₃(CF₂)₇CH₂CH₂SiCH₃(OCH₃)₂;

[0142] CF₃(CF₂)₉CH₂CH₂SiCH₃(OCH₃)₂;

[0143] (CF₃)₂CF(CF₂)₄CH₂CH₂SiCH₃(OCH₃)₃;

[0144] (CF₃)₂CF(CF₂)₆CH₂CH₂SiCH₃(OCH₃)₃;

[0145] (CF₃)₂CF(CF₂)₈CH₂CH₂SiCH₃(OCH₃)₃;

[0146] CF₃(C₆H₄)C₂H₄SiCH₃(OCH₃)₂;

[0147] CF₃(CF₂)₃(C₆H₄)C₂H₄SiCH₃(OCH₃)₂;

[0148] CF₃(CF₂)₅(C₆H₄)C₂H₄SiCH₃(OCH₃)₂;

[0149] CF₃(CF₂)₇(C₆H₄)C₂H₄SiCH₃(OCH₃)₂;

[0150] CF₃(CF₂)₃CH₂CH₂Si(OCH₂CH₃)₃;

[0151] CF₃(CF₂)₅CH₂CH₂Si(OCH₂CH₃)₃;

[0152] CF₃(CF₂)₇CH₂CH₂Si(OCH₂CH₃)₃;

[0153] CF₃(CF₂)₉CH₂CH₂Si(OCH₂CH₃)₃; and,

[0154] CF₃(CF₂)₇SO₂N (C₂H₅)C₂H₄CH₂Si(OCH₃)₃.

[0155] By using a fluroalkyl group-containing polysiloxane as a binder,the lyophobic property of a non-exposed part of a wettability-changeablelayer is improved greatly, whereby exerting a function for preventingthe deposition of a composition for the functional part such as an inkfor coloring a pixel part for example in the case where the functionalelement is a color filter.

[0156] As a reactive silicone (2) described above, a compound having abackbone represented by Formula:

[0157] wherein n is an integer of 2 or more, each of R¹ and R² is asubstituted or unsubstituted alkyl, alkenyl, aryl, or cyanoalkyl grouphaving 1 to 10 carbon atoms provided that 40% by mole or less of thetotal is vinyl, phenyl, and halogenated phenyl. A compound whose R¹ andR² are methyl groups is preferred because of its lowest surface energy,with the methyl group present in an amount of 60% by mole or more beingpreferred. The terminal of the chain or side chain has at least onereactive group such as a hydroxyl group in its molecule chain.

[0158] An organopolysiloxane described above maybe mixed with a stableorganosilicone compound which undergoes no crosslinking, such as adimethylpolysiloxane.

[0159] While this embodiment can employ various materials such asorganopolysiloxanes in a wettability-changeable layer, it is effectivefor a wettable pattern formation to introduce fluorine to thewettability-changeable layer. Accordingly, it is preferred to introducea fluorine to a material which is difficult to be deteriorated ordecomposed by the effect of a photocatalyst, and more typically, it ispreferred to introduce fluorine to an organopolysiloxane material toform a wettability-changeable layer.

[0160] A method for incorporating fluorine to an organopolysiloxanematerial may for example be a method in which fluorine is bound with arelatively low binding energy to an ingredient usually having a highbinding energy or a method in which a fluorine compound bound with arelatively low binding energy is admixed into a wettability-changeablelayer. By introducing fluorine by such a method, the fluorine bindingsite at which the binding energy is relatively low is decomposed firstupon exposure, whereby eliminating the fluorine from awettability-changeable layer.

[0161] The first method described above, i.e., the method in whichfluorine is bound with a relatively low binding energy to a binderhaving a high binding energy, may for example be a method in which afluoroalkyl group is introduced as a substituent into anorganopolysiloxane described above.

[0162] In a method for obtaining an organopolysiloxane, anorganopolysiloxane exerting a substantial strength can be obtained byhydrolysis or polymerization condensation of chloro- or alkoxysilane ina sol-gel reaction as described above in (1). While in such a method anorganopolysiloxane is obtained by subjecting one or more of siliconcompounds represented by Formula:

Y_(n)SiZ_((4−n))

[0163] wherein Y denotes an alkyl group, fluoroalkyl group, vinyl group,amino group, phenyl group or epoxy group, X denotes an alkoxyl group,acetyl group or halogen, and n denotes an integer of 0 to 3 to ahydrolytic condensation or hydrolytic co-condensation, anorganopolysiloxane having a fluoroalkyl group as a substituent can beobtained by conducting the synthesis using a silicon compound having afluoroalkyl group as a substituent Y. When using as a binder such anorganopolysiloxane having a fluoroalkyl group as a substituent, thecarbon bond of the fluoroalkyl group is decomposed, upon exposure, bythe effect of a photocatalyst contained in a photocatalyst-containinglayer which is in contact, whereby reducing the fluorine content of anexposed part in a wettability-changeable layer.

[0164] While a fluoroalkyl group-containing silicon compound employedhere is not limited particularly provided that it has a fluoroalkylgroup, it is preferably a silicon compound which has at least onefluoroalkyl group and whose fluoroalkyl group has 4 to 30, preferably 6to 20, more preferably 6 to 16 carbon atoms. Examples of such a siliconcompound are as described above, and a silicon compound whosefluoroalkyl group has 6 to 8 carbon atoms, i.e., a fluoroalkylsilane, ispreferred.

[0165] In this embodiment, a silicon compound having such a fluoroalkylgroup may be combined with a silicon compound containing no fluoroalkylgroup described above to employ its hydrolytic co-condensate as anolganopolysiloxane, or one or more of the fluoroalkyl group-containingsilicon compounds are combined to employ their hydrolytic condensate orhydrolytic co-condensate as an olganopolysiloxane.

[0166] In a fluoroalkyl group-containing organopolysiloxane thusobtained, a fluoroalkyl group-containing silicon compound describedabove is present in an amount of 0.01% by mol or more, preferably 0.1%by mol or more based on the silicon compounds as constituents of thisorganopolysiloxane.

[0167] By containing the fluoroalkyl group in an amount specified above,the lyophobic ability on a wettability-changeable layer is increased,whereby increasing the difference in the wettability from that in anexposed lyophilic region.

[0168] While in the method of (2) described above an organopolysiloxaneis obtained by crosslinking a highly lyophobic reactive silicone, it issimilarly possible also in this case to incorporate fluorine into awettability-changeable layer by employing fluorine-containingsubstituents as one or both of R¹ and R² in the formula shown above, andit is also possible that the fluorine content on the surface of thewettability-changeable layer can be reduced by exposure since thedecomposition occurs upon exposure at the fluoroalkyl group whosebinding energy is lower than a siloxane bond.

[0169] On the other hand, the latter method where a fluorine compoundbound with a lower energy than the binding energy of a binder may forexample be a method in which a fluorine-based surfactant is introducedwhen a low molecular weight fluorine compound is intended to beincorporated, or a method in which a fluorine resin whose compatibilitywith a binder resin is high is incorporated when a high molecular weightfluorine compound is intended to be incorporated.

[0170] A wettability-changeable layer in this embodiment can furthercontain surfactants. Those exemplified typically are hydrocarbon-basedsurfactants such as each series of NIKKOL BL, BC, BO and BB (NikkoChemicals Co., Ltd.) and fluorine-based or silicone-based nonionicsurfactants such as ZONYL FSN and FSO (Du Pont Kabushiki Kaisha),Surflon S-141 and 145 (Asahi Glass Company), MEGAFACE-141 and 144(Dainippon Ink and Chemicals, Incorporated), Ftergent F-200 and F251(NEOS CORPORATION.), UNIDYNE DS-401 and 402 (DAIKIN INDUSTRIES, Ltd.),FLOLADE FC-170 and 176 (3M) and the like, as well as cationicsurfactants, anionic surfactants and zwitterionic surfactants.

[0171] In addition to the surfactants listed above, oligomers andpolymers of polyvinyl alcohols, unsaturated polyesters, acrylic resins,polyethylenes, diallyl phthalate, ethylenepropylenediene monomer, epoxyresins, phenol resins, polyurethane, melamine resins, polycarbonates,polyvinyl chlorides, polyamides, polyimides, styrene butadiene rubbers,chloroprene rubbers, polypropylenes, polybutylenes, polystyreness,polyvinyl acetates, polyesters, polybutadienes, polybenzimidazoles,polyacrylonitriles, epichlorohydrins, polysulfites, polyisoprenes andthe like may also be contained in a wettability-changeable layer.

[0172] Such a wettability-changeable layer can be formed by dispersingthe components described above if necessary together with otheradditives in a solvent to prepare a coating solution, followed bycoating this coating solution on a substrate. The solvent employed hereis preferably an alcoholic solvent such as ethanol and isopropanol. Thecoating may be accomplished by a known coating method such as spin coat,spray coat, dip coat, roll coat and bead coat. When a component of UVsetting type is contained, a wettability-changeable layer can be formedby irradiating a UV ray to effect setting.

[0173] In this embodiment, the thickness of a wettability-changeablelayer is preferably 0.001 μm to 1 μm in view of the rate of the changein the wettability by a photocatalyst, more preferably 0.01 to 0.1 μm.

[0174] In the present invention, by employing a wettability-changeablelayer having the components described above, the wettability of anexposed part is changed to be lyophilic by the effect of the oxidationand degradation of the organic groups as parts of the components andadditives described above as a result of the activity of a photocatalystcontained in a photocatalyst-containing layer in contact, wherebyobtaining a substantial difference in the wettability from a non-exposedpart. Accordingly, the resultant increase in the ability of receiving(lyophilic) and repelling (lyophobic) a composition for the functionalpart such as an ink for coloring a pixel part enables the production ofa high quality and cost efficient functional element, such as a colorfilter.

[0175] A wettability-changeable layer employed in this embodiment may beof a self supporting or non-self supportive material provided that it ismade from a material provided that it is made from a material whosesurface wettabilty can be changed by the effect of a photocatalyst. Theself supporting material mentioned in this embodiment means a materialcapable of existing in a shape without a support.

[0176] In this embodiment, a non-self supporting wettability-changeablelayer is preferred. A wettability-changeable layer formed from amaterial undergoing a substantial change in the characteristicsdescribed above is poorly self-supportive in general, and becomes usefulas a pattern-forming body by being formed on a transparent substrate toenhance the mechanical strength.

[0177] While a wettability-changeable layer employed in this embodimentis not limited particularly provided that its wettability is changed bythe effect of a photocatalyst described above, it is preferably a layercontaining no photocatalyst. The absence of any photocatalyst in thewettability-changeable layer enables a prolonged satisfactory use of afunctional element, which is produced subsequently, without any adversesustained effect of the photocatalyst.

[0178] (Decomposition-removable Layer)

[0179] A decomposition-removable layer is discussed below. Adecomposition-removable layer employed in this embodiment is not limitedparticularly provided that it is a layer in which adecomposition-removable layer in an exposed part is decomposed andremoved upon exposure by the effect of a photocatalyst in aphotocatalyst-containing layer.

[0180] Since in such a decomposition-removable layer an exposed part isdecomposed and removed by the effect of a photoctalyst, it is possibleto form a pattern comprising both of the parts with and without thedecomposition-removable layer, i.e., an irregular pattern, withoutconducting developing or washing process.

[0181] Also since this decomposition-removable layer is oxidized by theeffect of a photocatalyst upon an exposure to be vaporized, it can beremoved without any particular post-treatments such as developing orwashing process, but it may be washed depending on the material for thedecomposition-removable layer.

[0182] A decomposition-removable layer employed in this embodiment ispreferably not only an irregular-forming layer but also a layer whosecontact angle with a liquid is higher when compared with a transparentsubstrate described above. By such characteristics, it is possible toobtain as a lyophilic region a region where the decomposition-removablelayer is decomposed and removed to allow the transparent substrate tocome out and as a lyophobic region a region where thedecomposition-removable layer is remaining, whereby enabling theformation of various patterns.

[0183] It is preferable here that the decomposition-removable layer ofthis embodiment gives a contact angle with a liquid whose surfacetension is 40 mN/m of 10° or more, preferably a contact angle with aliquid whose surface tension is 30 mN/m of 10° or more, particularly acontact angle with a liquid whose surface tension is 20 mN/m of 10° ormore.

[0184] In this embodiment, when a characteristic-changeable layer isdecomposition-removable layer, then it is preferable that a transparentsubstrate described below is lyophilic, typically giving a contact anglewith a liquid whose surface tension is 40 mN/m of 9° or less, preferablya contact angle with a liquid whose surface tension is 40 mN/m of 5° orless, particularly 1° or less.

[0185] By adjusting the wettability of a decomposition-removable layerand a transparent substrate within the ranges specified above, it ispossible to form as a lyophilic region a region where the transparentsubstrate comes out and as a lyophobic region a region where thedecomposition-removable layer is remaining, whereby enabling theformation of a highly minute pattern. The contact angle mentioned heremeans the value measured as described above.

[0186] The transparent substrate here may be one whose surface has beentreated to impart a lyophilicity. Examples of those whose surfaces aretreated to impart a lyophilicity are those treated lyophilically byplasma treatment utilizing argon or water, and a lyophilic layer formedon a transparent substrate may for example be a silica film obtained bysubjecting tetraethoxysilane to a sol-gel process. In this embodiment,the part where the transparent substrate comes out serves as a lyophilicregion.

[0187] A film which can be employed as a decomposition-removable layerdescribed above may typically be a film of a fluorine-based orhydrocarbon-based resin having a lyophobic ability. Such afluorine-based or hydrocarbon-based resin is not limited particularlyprovided that it has a lyophobic ability, and such a resin is dissolvedin a solvent and formed into a film by an ordinary film-forming methodsuch as a spin coating process.

[0188] Also in this embodiment, a functional thin film, i.e., aself-assembled monolayer, Langmuir-Blodgett film or layer-by-layerself-assembled film can be employed to form a film having no defects,and such a film-forming method is employed preferably.

[0189] A self-assembled monolayer, Langmuir-Biodgett film andlayer-by-layer self-assembled film employed in this embodiment aredescribed in detail below.

[0190] (i) Self-assembled Monolayer

[0191] While we do not know the existence of any official definition ofa self-assembled monolayer, Abraham Ulman's “Formulation and Structureof Self-Assembled Monolayers”, ChemicalReview, 96, 1533-1554 (1996) isan excellent textbook discussing those recognized generally asself-assembled monolayers. Based on this textbook, a self-assembledmonolayer is a monomolecular layer resulting from the absorption andbinding (self-assembling) of a suitable molecule onto the surface of asuitable substrate. A material having a self-assembled monolayer-formingability may for example be a surfactant molecule such as fatty acids, anorganic silicon molecule such as alkyltrichlorosilanes andalkylalkoxides, an organic sulfur molecule such as alkanethiols, and anorganic phosphorus molecule such as alkyl phosphates. A common aspect ofthe molecular structures is a relatively long alkyl chain and one end ofeach molecule having a functional group which interact with the surfaceof a substrate. The alkyl chain moiety is the source of theintermolecular force for a secondary packing between molecules. Thestructure exemplified here is the most simple one, and self-assembledmonolayers comprising various molecules have been reported including amolecule having a functional group such as an amino or carboxyl group onone end of the molecule and a molecule whose alkylene chain moiety is anoxyethylene chain, fluorocarbon chain, or a mixture thereof. A compositeself-assembled monolayer comprising several molecular species is alsopresent. Furthermore, a particulate polymer having several functionalgroup (sometimes single functional group) such as dendrimer or a linearpolymer (sometimes containing branches) which has been formed on thesurface of a single-layer substrate (the latter is referred to generallyas polymer brush) is regarded sometimes also as a self-assembledmonolayer. Such a film is included in self-assembled monolayers in thisembodiment.

[0192] (ii) Langmuir-Blodgett Film

[0193] A Langmuir-Blodgett film employed in this embodiment does nothave any significant morphological difference from a self-assembledmonolayer described above once formed on a substrate. TheLangmuir-Blodgett film is characterized by the production method and thehighly packed (highly oriented, highly ordered) secondary moleculesresulting from such a production method. Thus, in general, aLangmuir-Blodgett film is expanded first on a gas-liquid interface, andthe expanded film is condensed by a trough to change into a highlypacked condensed film. Actually, this condensed film is transferred ontoa suitable substrate and then used. By means of a procedure outlinedhere, it is possible form a monomolecular film or multilayer film havingsuitable number of layers. It is also possible to use not only a lowmolecular weight material but also a high molecular weight material orcolloidal particle as a material for producing a film. Currentapplications of various materials are discussed in N.MIYAJI, “Potentialof soft-based nanodevice production in nanotechnology”, KOBUNSHI,Vol.50, September issue, p644-647 (2001).

[0194] (iii) Layer-by-layer Self-assembled Film

[0195] A layer-by-layer self-assembled film is a form formed generallyby allowing a material having a functional group carrying at least twopositive or negative charge to be adsorbed and deposited sequentially toform a lamination. Since a material having a large number of functionalgroups is advantageous for example due to an increased strength ordurability of the film, an ionic polymer (polymeric electrolyte) isemployed frequently as a material in these days. A particle having asurface charge such as proteins, metals, and oxides, i.e., “colloidalparticle”, is employed widely as a film-forming material. Recently, afilm utilizing an interaction which is even weaker than that of ionicbond, such as hydrogen bond, coordinate bond, hydrophobic interactionand the like was also reported. Relatively current text oflayer-by-layer self-assembled film is detailed in Paula T. Hammomd,“Recent Explorations in Electrostatic Multilayer Thin Film Assembly”,Current Opinion in Colloid & Interface Science, 4, 430-442 (2000)although the discussion focuses on the materials whose driving forcesare electrostatic interactions. A layer-by-layer self-assembled film forexample in the simplest process is a film formed by performing the cycleof positively (negatively) charged materialadsorption-washing-negatively (positively) charged materialadsorption-washing several times repetitively. There is no need of theprocedure of expansion-condensation-transfer as is conducted for aLangmuir-Blodgett film. As evident from the difference in the productionmethod described above, a layer-by-layer self-assembled film generallydoes not have a two-dimensional highly orienting and highly orderingproperty as is observed with a Langmuir-Blodgett film. Nevertheless, alayer-by-layer self-assembled film and a method for producing the sameare advantageous greatly when compared with conventional film-formingmethods, since they allow a minute film without defects to be formedreadily and also allow a film to be formed uniformly even on a fineirregular-carrying surface, inner wall of a tube or spherical surface.

[0196] The thickness of a decomposition-removable layer is not limitedparticularly provided that it enables the decomposition and removal bythe energy irradiated in an exposure process described below. While thetypical film thickness may vary greatly depending on the type of theenergy irradiated or the material for the decomposition-removable layer,it is usually 0.001 μm to 1 μm, preferably 0.01 μm to 0.1 μm.

[0197] (Light-shading Part)

[0198] A light-shading part is described below.

[0199] A light-shading part employed in this embodiment is formed, asshown for example in FIG. 3 and FIG. 4, as a pattern in the sitecorresponding to the position where a light-shading part 5 allows asurface of a characteristic-changeable layer 6 on a transparentsubstrate 4 to be a non-exposed part. In this embodiment, the positionwhere the light-shading part is formed can be in two configurationswhich are shown in FIG. 3 and FIG. 4.

[0200]FIG. 3 shows a configuration of a pattern-forming body substrateemployed in FIG. 1 comprising a light-shading part 5 which is formed asa pattern on a transparent substrate 4 and covered with acharacteristic-changeable layer 6.

[0201] On the other hand, FIG. 4 shows a configuration in which acharacteristic-changeable layer 6 is formed on one side of a transparentsubstrate 4 and the light-shading part is formed as a pattern on theother side.

[0202] The configuration shown in FIG. 3 indicates that a light-shadingpart is formed on the surface of a characteristic-changeable layer, i.e.in the position closest to the part of the contact with aphotocatalyst-containing layer in a method for producing apattern-forming body of the present invention. Accordingly, when theexposure is effected on the side of the transparent substrate forproducing a pattern-forming body, the irradiated energy is not scatteredand arrives at the surface of characteristic-changeable layer whilereflecting the pattern formed by the light-shading part correctly.Accordingly, this configuration is advantageous greatly for the purposeof forming the characteristic-changeable pattern at a high accuracy.

[0203] On the other hand, the configuration shown in FIG. 4 indicatesthat a characteristic-changeable layer and a light-shading layer areformed on the different sides of a transparent substrate. Thisconfiguration is employed preferably when the light-shading part isdesired to be removed after exposure to form a pattern-forming body orwhen the smoothness of the surface of the characteristic-changeablelayer is important.

[0204] Such a light-shading part can be formed also by forming a thinfilm of a metal such as chromium whose thickness is 1000 to 2000angstrom by a sputtering method, a vacuum vapor deposition method, andthe like followed by patterning this thin film. Such a patterning may beaccomplished by an ordinary patterning method such as a sputtering.

[0205] The material for a light-shading part in this embodiment is notlimited particularly provided that it can serve as an interceptor to theenergy causing the excitation of a photocatalyst upon exposure, and maytypically be a layer formed by dispersing a light-shading particle suchas a carbon fine grain, metal oxide, inorganic pigment, and organicpigment in a resin binder. The resin binder employed may for example bepolyimide resins, acryl resins, epoxy resins, polyacrylamides, polyvinylalcohols, gelatins, caseins, and cellulose resins, which may be employedalone or in combination, as well as photosensitive resins, O/W emulsionresin compositions, such as emulsified reactive silicone. The thicknessof the light-shading resin part is within the range from 0.5 to 10 μm. Amethod for patterning the light-shading resin part may be an ordinarilyemployed method such as photo-lithography or printing process.

[0206] (Transparent Substrate)

[0207] A transparent substrate in this embodiment is described below. Inthis embodiment, as shown in FIG. 3 and FIG. 4, a light-shading part 5and a characteristic-changeable layer 6 are provided on a transparentsubstrate 4.

[0208] Such a transparent substrate is not limited particularly providedthat it exhibits a high transmittance to an energy employed forexposure, and typically, one exhibiting a high transmittance to anenergy activating titanium oxide employed preferably as a photocatalyst,such as one exhibiting a high transmittance to a UV ray is employedpreferably. Such a transparent substrate may be flexible or non-flexibledepending on the application of a functional element.

[0209] Preferred materials exemplified typically are non-flexibletransparent rigid materials such as quartz glasses, PYREX (trade mark),synthetic quartz and the like as well as flexible transparent materialssuch as transparent resin films and optical resin sheets.

[0210] (2) Embodiment 2

[0211] Embodiment 2 of a pattern-forming body substrate of the presentinvention is described below. A pattern-forming body substrate in thisembodiment has a characteristic-changeable layer having a selfsupporting property on which a light-shading part is formed as apattern.

[0212]FIG. 2 shows an example of a pattern-forming body substrateemployed in this embodiment, in which a light-shading part 5 is formedon either surface of a characteristic-changeable layer 6 to form apattern-forming body substrate.

[0213] (Characteristic-changeable Layer)

[0214] First, a characteristic-changeable layer in this embodiment isdiscussed. A characteristic-changeable layer in this embodiment is notlimited particularly provided that it is a layer whose characteristicsare changed by the effect of a photocatalyst-containing layer and whichhas a self supporting property, and may be a layer whose color,polarity, or adhesiveness is changed by the effect of a photocatalystsimilarly to Embodiment 1. In this embodiment, a commercial resin filmcomprising a material capable of serving as a characteristic-changeablelayer can be employed to promote the cost efficiency.

[0215] In this embodiment, among the characteristic-changeable layersmentioned above, a wettability-changeable layer whose wettability ischanged by the effect of a photocatalyst is preferred. Such awettability-changeable layer may typically be made from a material whichis changed in such a manner that when it is brought into contact withthe photocatalyst-containing layer upon exposure the contact angle witha liquid whose surface tension is equivalent to the surface tension of acomposition for the functional part to be applied subsequently ischanged at least by 1° or more, preferably 5° or more, especially 10° ormore.

[0216] A self supporting material serving as a wettability-changeablelayer in this embodiment may be one formed as a film from a materialdescribed above provided that such a film has a self supportive ability,and those which may be exemplified are polyethylenes, polycarbonates,polypropylenes, polystyrenes, polyesters, polyvinyl fluorides, acetalresins, nylon, ABS, PTFE, methacrylic resins, phenol resins,polyvinylidene fluorides, polyoxymethylenes, polyvinyl alcohols,polyvinyl chlorides, polyethylene terephthalates, silicones and thelike.

[0217] While a characteristic-changeable layer in this embodiment is notlimited particularly provided that it is a layer whose characteristicsare changed by the effect of a photocatalyst as described above, it ispreferably a layer containing no photocatalyst. The absence of anyphotocatalyst in the characteristic-changeable layer eliminates asustained adverse effect on a functional element produced subsequently,enabling a prolonged satisfactory use.

[0218] (Light-shading Part)

[0219] A light-shading part employed in this embodiment is similar tothat employed in Embodiment 1 described above, and is not discussed hereagain.

[0220] 3. Arrangement of Characteristic-changeable Layer andPhotocatalyst-containing Layer

[0221] The arrangement of a characteristic-changeable layer and aphotocatalyst-containing layer is described below. In this embodiment, aphotocatalyst-containing layer should be arranged in contact with acharacteristic-changeable layer upon exposure.

[0222] The contact mentioned in this embodiment means a condition underwhich the effect of a photocatalyst can substantially be exerted on thesurface of a characteristic-changeable layer, including a condition ofan actual physical contact as well as a condition shown in FIG. 5 wherea photocatalyst-containing layer 2 is arranged at a certain distancefrom a characteristic-changeable layer 6. The distance is preferably 200μm or less.

[0223] The distance in this embodiment is within the range of 0.2 μm to10 μm, preferably 1 μm to 5 μm, for the purpose of an extremelysatisfactory pattern accuracy and a high sensitivity of a photocatalystwhich gives a satisfactory denaturalizing efficiency of acharacteristic-changeable layer. The distance within the range specifiedabove is effective especially in producing a pattern-forming body havinga small surface area whose distance can be controlled at a highaccuracy.

[0224] On the other hand, an employed pattern-forming body whose size isas large as 300 mm×300 mm poses a difficulty in allowing a distance asshort as that described above to be provided between aphotocatalyst-containing layer-sided substrate and a pattern-formingbody with avoiding any contact. Accordingly, a pattern-forming bodyhaving a relatively large surface area employs a distance within therange from 10 to 100 μm, preferably 50 to 75 μm. The distance within therange specified above serves to prevent a problematic reduction in thepattern accuracy such as an obscure pattern, a problematic deteriorationof the photocatalyst sensitivity which leads to a reduced denaturalizingefficiency, and a problematically uneven denaturalization of thecharacteristic-changeable layer.

[0225] When exposing such a relatively large pattern-forming body, thedistance to be adjusted by an espousing device for positioning aphotocatalyst-containing layer-sided substrate and a pattern-formingbody is set to be within the range from 100 μm to 200 μm, preferably 25μm to 75 μm. The setting of the distance within this range avoids thesubstantial reduction in the pattern accuracy or the deterioration inthe photocatalyst sensitivity, and enables the arrangement of thephotocatalyst-containing layer-sided substrate and the pattern-formingbody without undergoing any contact.

[0226] By arranging a photocatalyst-containing layer and acharacteristic-changeable layer at a certain distance described above,oxygen, water, and active oxygen species generated by the photocatalysteffect can readily be desorbed. Thus, a distance between aphotocatalyst-containing layer and a characteristic-changeable layershorter than that specified above makes the desorption of the activeoxygen species difficult, resulting in a reduced denaturalizing rate. Adistance larger than that specified above poses difficulty in allowingthe generated active oxygen species to arrive at thecharacteristic-changeable layer, also resulting in a reduceddenaturalizing rate.

[0227] In this embodiment, the contact in the manner described above maybe maintained at least for the period of the exposure.

[0228] 4. Exposure of Contact Part

[0229] In the present invention, the contact part is exposed whilemaintaining the condition of the contact as described above. Theexposure mentioned here means a concept including any energy irradiationcapable of allowing a photocatalyst-containing layer to change thecharacteristics of a surface of a characteristic-changeable layer, andis not limited to the irradiation of a visual light.

[0230] The wavelength of a light employed usually in such an exposure is400 nm or less, preferably 380 nm or less. Such a wavelength ispreferable as energy to activate the photocatalytic effect of titaniumoxide which is contained as a photocatalyst preferably in aphotocatalyst-containing layer.

[0231] A light source employed in the exposure may for example be amercury lamp, metal halide lamp, xenon lamp, excimer lamp, and the like.

[0232] The energy irradiation level for the exposure should besufficient to accomplish the change in the characteristics of thesurface of a characteristic-changeable layer as a result of the effectof a photocatalyst contained in a photocatalyst-containing layer.

[0233] In this process, the sensitivity can be increased by conductingthe exposure with heating the photocatalyst-containing layer, allowingthe change in the characteristics to occur efficiently. Typically, theheating is accomplished at a temperature within the range from 30° C. to80° C.

[0234] The exposure in the present invention is directed from the sideof the pattern-forming body substrate over the entire surface of thepattern-forming body substrate on the side where nocharacteristic-changeable layer is formed, unless any particularrequirement is specified.

[0235] 5. Removal of Photocatalyst-containing Layer-sided Substrate

[0236] After completing the exposure as described above, aphotocatalyst-containing layer-sided substrate is removed from theposition where it is in contact with a characteristic-changeable layer,whereby obtaining a pattern-forming body 7′ as shown in FIG. 1D.

[0237] A pattern-forming body thus obtained has on its surface a patternin which the characteristics of a characteristic-changeable layer havebeen changed, and by placing in this denaturalized region a compositionfor the functional part, the functional part can be formed as a pattern,whereby enabling the production of various functional elements.

[0238] B. Pattern-forming Bodies

[0239] A pattern-forming body of the present invention is describedbelow. A pattern-forming body of the invention is an article having apattern where the characteristics of a characteristic-changeable layerhave been changed on a pattern-forming body substrate described in thesections of “2. Pattern-forming body substrate” in “A. Methods forproducing pattern-forming bodies” described above.

[0240] A characteristic-changeable layer in the present invention is notlimited particularly, and may for example be a layer which is colored orwhose adhesiveness is changed by the effect of a photocatalyst, and inthe invention it is preferable that the characteristic-changeable layeris a wettability-changeable layer or a decomposition-removable layer.

[0241] When the characteristic-changeable layer is awettability-changeable layer, a material for a wettability-changeablelayer described above in the section of the pattern-forming bodysubstrate can be employed, and a pattern formed typically is a patterncomprising a lyophilic region and a lyophobic region having suchcharacteristics that the contact angle with a liquid whose surfacetension is equivalent to the surface tension of a composition for thefunctional part to be applied subsequently is different from each otherat least by 1° or more, preferably 5° or more, especially 10° or more.

[0242] A lyophobic region in a pattern-forming body in this embodimentis characterized by a contact angle with a liquid whose surface tensionis 40 mN/m of 10° or more, preferably a contact angle with a liquidwhose surface tension is 30 mN/m of 10° or more, particularly a contactangle with a liquid whose surface tension is 20 mN/m of 10° or more.

[0243] A lyophilic region in a pattern-forming body in this embodimentis characterized by a contact angle with a liquid whose surface tensionis 40 mN/m of 9° or less, preferably a contact angle with a liquid whosesurface tension is 50 mN/m of 10° or less, particularly a contact anglewith a liquid whose surface tension is 60 mN/m of 10° or less.

[0244] When the characteristic-changeable layer is adecomposition-removable layer, a material for a decomposition-removablelayer described above in the section of the pattern-forming bodysubstrate can be employed, and a pattern formed in the pattern-formingbody typically comprising the region of the decomposition-removablelayer and the region where the decomposition-removable layer has beenremoved to allow a transparent substrate to come out. In thepattern-forming body whose decomposition-removable layer has beendecomposed and removed, it is preferable that the region comprising thedecomposition-removable layer and the region comprising the transparentsubstrate layer are different from each other in the wettability, andmore preferable that the region comprising the decomposition-removablelayer is a lyophobic region and the region comprising the transparentsubstrate layer is the lyophilic region.

[0245] A lyophobic region comprising a decomposition-removable layer inthis embodiment is characterized preferably by a contact angle with aliquid whose surface tension is 40 mN/m of 10° or more, preferably acontact angle with a liquid whose surface tension is 30 mN/m of 10° ormore, particularly a contact angle with a liquid whose surface tensionis 20 mN/m of 10° or more.

[0246] A lyophilic region comprising a transparent substrate in thisembodiment is characterized preferably by a contact angle with a contactangle with a liquid whose surface tension is 40 mN/m of 9° or less,preferably a contact angle with a liquid whose surface tension is 40mN/m of 5° or less, particularly 1° or less.

[0247] A pattern-forming body of the present invention enables theproduction of various functional elements by depositing a compositionfor the functional part along the pattern formed as a result of thechange in the characteristics of its characteristic-changeable layer. Apattern-forming body in the present invention may itself be a functionalelement having a function.

[0248] A pattern-forming body of the present invention is formedpreferably from a material having no photocatalyst. When apattern-forming body is formed from a material containing aphotocatalyst, it is subjected to an unwanted sustained effect dependingon the condition of the use.

[0249] Other aspects of a pattern-forming body of the present inventionare similar to those described above in the section of “2.Pattern-forming body substrate” and are not discussed here again.

[0250] C. Functional Elements

[0251] A functional element of the present invention is characterized bya functional part formed as a pattern where the characteristics of apattern-forming body described above have been changed.

[0252] The term “functional” mentioned here means various functions suchas optical functions (selective light absorption, reflection,polarization, selective light transmission, non-linear optical property,luminescence such as fluorescence and phosphorescence, photochromicproperty and the like), magnetic functions (ferromagnetic property,electrochemical property, soft magnetic property, non-magnetic property,magnetism-transmitting property), electric and electronic functions(conductivity, insulating property, piezoelectric property, pyroelectricproperty, dielectric property), chemical functions (adsorption,desorption, catalytic property, hygroscopicity, ion transmittingproperty, redox property, electrochromic property and the like),mechanical functions (wearing resistance and the like), thermalfunctions (thermal transmission, thermal insulation, infraredirradiation and the like), biological functions (biocompatibility,thrombolytic property and the like).

[0253] The placement of such a functional part to the positioncorresponding to the pattern on a pattern-forming body is conducted onthe basis of the difference in the wettability between a lyophilicregion and a lyophobic region, or on the basis of the difference in theadhesiveness.

[0254] For example when utilizing the difference in the adhesiveness ofthe characterized pattern on a characteristic-changeable layer, a metalas a composition for the functional part is vapor-deposited all over thecharacteristic-changeable layer and subsequently peeled off using anadhesive tape and the like, whereby forming a metal pattern as afunctional part exclusively in the region where the adhesiveness issatisfactory. This enables an easy formation of a print circuit boardand the like.

[0255] For example when utilizing the difference in the wettability ofthe characterized pattern on a characteristic-changeable layer, acomposition for the functional part is applied onto the pattern-formingbody to allow it to deposit exclusively onto the satisfactorily wettablelyophilic region, whereby allowing the functional part to be placedreadily and exclusively on the pattern in the lyophilic region of thepattern-forming body.

[0256] A composition for the functional part employed in the presentinvention may vary greatly depending on the functions of the functionalelement and the method for producing the functional element as describedabove, and for example when forming a metal pattern on the basis of thedifference in the adhesiveness as described above then this compositionfor the functional part is present as a metal, and when forming a metalpattern on the basis of the difference in the wettability then acomposition which has not been diluted with a solvent such as a UVsetting monomer or a composition in the form of a liquid which has beendiluted with a solvent can be employed.

[0257] When using a liquid composition which has been diluted with asolvent, the solvent is preferably one exhibiting a high surface tensionsuch as water and ethylene glycol. As a composition for the functionalpart, one having a lower viscosity is more preferred since a pattern canbe formed within a shorter period. Nevertheless, when using a liquidcomposition which has been diluted with a solvent, the solvent ispreferably less volatile since the volatilization of the solvent uponforming a pattern results in an increase in the viscosity and the changein the surface tension.

[0258] A composition for the functional part employed in the presentinvention may be one becoming a functional part by being placed on apattern-forming body for example by means of adhesion, or one becoming afunctional part by being placed on a pattern-forming body and thentreated for example with a reagent, UV ray, or heat. In such a case, acomponent which is hardened by a UV ray, heat, or electron beam iscontained preferably as a binder for the composition for the functionalpart since it allows the functional part to be formed rapidly by ahardening process.

[0259] Typically, such a functional element can be formed by applying acomposition for the functional part by means of a coating process suchas dip coating, roll coating, blade coating, and spin coating, or bymeans of a nozzle injection such as an ink jet process, whereby forminga functional part on the lyophilic pattern on the surface of apattern-forming body.

[0260] Also by applying a pattern-forming body of the present inventionto a metal film-forming method by an electroless plating, a functionalelement having a pattern of a metal film as a functional part can beobtained. Typically, by utilizing the difference in the wettability,only the lyophilic region on the surface of a characteristic-changeablelayer of a pattern-forming body is treated with a pretreatment solutionof the chemical plating and then the treated pattern-forming body isimmersed in the chemical plating regent, whereby obtaining a functionalelement having a desired metal pattern on the characteristic-changeablelayer. Since a metal pattern can be formed without forming a resistpattern in this method, a print board and electronic circuit element canbe produced as a functional element.

[0261] It is also possible that after overlaying the composition for thefunctional part entirely as described above an unwanted region isremoved utilizing the difference in the wettability between thelyophobic region and the lyophilic region to form a functional partalong the pattern. Thus, by utilizing the difference in the adhesivenessbetween the lyophobic region and the lyophilic region, an unwantedregion is removed in a post-treatment process for example by sticking anadhesive tape followed by peeling off, by air-blowing, or by treatingwith a solvent, whereby yielding a pattern of the functional part.

[0262] In this case, it is required to place the composition for thefunctional part all over the surface of the characteristic-changeablelayer of the pattern-forming body of the present invention, for exampleby a vacuum film-forming device such as PVD and CVD.

[0263] An example of the method for producing such a functional elementis described with referring to the figures. In the following example, awettability-changeable layer is employed as a characteristic-changeablelayer. First, by employing a vacuum film-forming device 21 utilizing thevacuum such as CVD as shown in FIG. 6A, a composition for the functionalpart 22 is formed all over a pattern-forming body 7′ in which awettability-changeable layer 8 having a pattern of a lyophilic region 10and a lyophobic region 11 is provided on a transparent substrate 4. Onthe transparent substrate 4, a light-shading part 5 is formed as apattern.

[0264] A method for removing an unwanted part of the composition for thefunctional part 22 thus formed entirely may be a method in which theadhesive side of an adhesive tape 23 is applied and then peeled off toremove the composition for the functional part 22 on the lyophobicregion 11 to form a functional part 24 as shown in FIG. 6B or a methodin which air is blown from a air blowing nozzle 25 to remove theunwanted part of the composition for the functional part 22 to form afunctional part 24 as shown in FIG. 6C.

[0265] In a still another example, as shown in FIG. 7A, a heat transferarticle 28 formed by laminating a heat-fusable composition layer 27 onone side of a sheet 26 is brought into close contact with the surface ofa wettability-changeable layer 8 formed on a pattern-forming body 7′,i.e., on a transparent substrate 4 with bringing the heat-fusablecomposition layer 27 in contact with the wettability-changeable layer 8.Also in this case, a light-shading part 5 is formed as a pattern on thetransparent substrate 4.

[0266] Subsequently, as shown in FIG. 7(B), a heating plate 29 ispressed on the side of a sheet 26 of the heat transfer article 28. Thenas shown in FIG. 7(C), after cooling the heat transfer article 28 ispulled off to obtain a functional element in which a functional part 24is formed along the pattern in a lyophilic region 10 formed on thewettability-changeable layer 8 (FIG. 7(D)).

[0267] A functional element thus obtained may typically be a colorfilter, microlens, print board, electric circuit element and the like.

[0268] A pattern-forming body employed in the description of afunctional element described above is similar to that described above,and not discussed here again.

[0269] D. Color Filters

[0270] A color filter mentioned above is employed for example in aliquid crystal display, in which a plural of pixel parts such as red,green, and blue are formed as a highly minute pattern for example of aglass substrate. By applying a pattern-forming body of the presentinvention to the production of this color filter, a highly minute colorfilter can be obtained at a low cost.

[0271] Thus, an ink (composition for the functional part) is depositedfor example by an ink jet device onto a lyophilic region of apattern-forming body and then hardened to form a pixel part (functionalpart) easily, whereby allowing a highly minute color filter to beobtained by a smaller number of process.

[0272] Also in the present invention, a light-shading part of apattern-forming body described above can itself be used as a blackmatrix in a color filter. Accordingly, by forming a pixel part (coloredlayer) as a functional part on a pattern-forming body of the inventiondescribed above, a color filter can be obtained without forming a blackmatrix separately.

[0273] E. Microlenses

[0274] When a functional element is a microlens, a pattern-forming bodyhaving a round pattern whose wettability has been changed may forexample be formed on a wettability-changeable layer. Subsequently, alens-forming composition (composition for the functional part) is addeddropwise onto the site where the wettability has been changed to allowthe composition to spread exclusively on the lyophilic region where thewettability has been changed, and a further dropwise addition enablesthe change in the contact angle of the liquid drop. By hardening thislens-forming composition, a lens having varying shape and focal distancecan be obtained, whereby yielding a highly minute microlens.

[0275] In a method for producing such a microlens when described withreferring to FIG. 8, a pattern-forming body 7′ having a round pattern ofa lyophilic region 10 formed on a wettability-changeable layer 8 isprepared, and then toward the pattern of this round lyophilic region 10a UV setting resin composition as a composition for the functional partis ejected via an ejecting device 30 (FIG. 8A). This composition for thefunctional part (UV setting resin composition) 22 is swollen as a resultof the difference in the wettability between the lyophilic region 10 andthe lyophobic region 11 (FIG. 8B). This is then hardened by a resinsetting UV ray 31 to form a microlens 32 (FIG. 8C).

[0276] The present invention is not restricted to the embodimentsdescribed above. The embodiments described above are only illustrative,and those having the aspects substantially similar to the technicalspirits described in the aspects and exhibiting similar effects areencompassed in the present invention.

[0277] For example, while a light-shading part in the pattern-formingbody substrate is discussed in a method for producing a pattern-formingbody described above only as being formed on a transparent substrate, itcan be formed also on a characteristic-changeable layer. In such a case,the light-shading part serves as a spacer when the exposure is performedwith bringing the characteristic-changeable layer into contact with aphotocatalyst-containing layer.

[0278] Also while in the above description a functional element isdiscussed all as being formed on a pattern-forming body, the presentinvention is not limited to such an aspect. Thus, for example as shownin FIG. 9, a wettability-changeable layer 8 is formed first on atransparent substrate 4 by a method similar to that described above andthen a functional part 24 is formed along the pattern of the hydrophilicregion of this wettability-changeable layer 8 (FIG. 9A). Then anelement-forming substrate 33 is brought into close contact with thisfunctional part 24 (FIG. 9B). Then the functional part 24 is transferredonto the element-forming substrate 33, whereby obtaining a functionalelement. Thus, the functional element is not limited to be formed on apattern-forming body.

EXAMPLES

[0279] The present invention is further described in the followingexamples.

Example 1

[0280] A fluorine-based silicone was formed as a film whose thickness is0.1 μm on a quartz glass substrate having a pattern of a 0.2 μm-thickand 20 μm-wide chromium line formed an interval of 100 μm to form awettability-changeable layer to provide a pattern-forming bodysubstrate.

[0281] The fluorine-based silicone employed here was prepared byadmixing 5 g of a fluoroalkylsilane (GE Toshiba Silicones, TSL8233) with3 g of 1N hydrochloric acid, stirring for 24 hours, subjected to 10-folddilution with isopropyl alcohol to obtain a coating solution, which wasthen applied by a spin coating method and dried to form a film.

[0282] On a soda lime glass substrate, ST-K01 (Ishihara Sangyo Kaisha,Ltd.) was applied to provide a photocatalyst-containing layer-sidedsubstrate having a photocatalyst-containing layer whose thickness was0.2 μm. The substrate was arranged in such a manner that the wettabiltychange layer was facing the photocatalyst-containing layer at thedistance of 5 μm, and irradiated from the side of the pattern-formingbody substrate with a mercury lamp (254 nm, 40 mW/cm²) for 120 seconds.The wettability of the surface of the wettability-changeable layer inthe exposed part was 20° as a contact angle with water, while that of anon-exposed part was 110°.

[0283] Then the paints for a color filter (red, blue, green) wereejected sequentially by an ink jet method onto the part where thewettability had been changed on the pattern-forming body to obtain acolor filter.

Example 2

[0284] 1. Formation of Photocatalyst-containing Layer-sided Substrate

[0285] 5 g of trimethoxymethylsilane (GE Toshiba Silicones, TSL8113) wasmixed with 2.5 g of 0.5 N hydrochloric acid, and stirred for 8hours. Themixture was subjected to 10-fold dilution with isopropyl alcohol toobtain a primer layer-forming composition.

[0286] The primer layer-forming composition thus obtained was appliedonto a quartz glass substrate using a spin coater and dried at 150° C.for 10 minutes to form a transparent primer layer (thickness: 0.2 μm).

[0287] 30 g of isopropyl alcohol, 3 g of trimethoxymethylsilane (GEToshiba Silicones, TSL8113), and 20 g of inorganic coating forphotocatalyst ST-K03 (Ishihara Sangyo Kaisha, Ltd.) were mixed, andstirred at 100° C. for 20 minutes. The mixture was subjected to 3-folddilution with isopropyl alcohol to obtain a photocatalyst-containinglayer-forming composition.

[0288] The photocatalyst-containing layer-forming composition thusobtained was applied using a spin coater onto a quartz glass substrateon which a primer layer had been formed, and dried at 150° C. for 10minutes to obtain a transparent photocatalyst-containing layer(thickness: 0.15 μm)

[0289] 2. Patterning of Self Supporting Characteristic-changeable Layerby Exposure

[0290] The photocatalyst-containing layer-sided substrate and apolycarbonate substrate on the surface of which a light-shading layerhad been formed were aligned to face each other at a distance of 100 μm,and exposed from the side of the polycarbonate substrate with a veryhigh pressure mercury lamp (wavelength: 365 nm) at 40 mW/cm² for 1200seconds to form a pattern whose characteristics had been changed.

[0291] In this procedure, the contact angles of the non-exposed part andthe exposed part with the wettability index standard solution whosesurface tension was 40 mN/m (JUNSEI CHEMICAL CO., LTD.) were measuredusing a contact angle meter (Kyowa Interface Science Co., LTD., ModelCA-Z) (30 seconds after dropwise addition from a microsyringe), and theresults indicated that the contact angles were 49° and 20°,respectively.

Example 3

[0292] 1. Formation of Photocatalyst-containing Layer-sided Substrate

[0293] 5 g of trimethoxymethylsilane (GE Toshiba Silicones, TSL8113) wasmixed with 2.5 g of 0.5 N hydrochloric acid, and stirred for 8 hours.The mixture was subjected to 10-fold dilution with isopropyl alcohol toobtain a primer layer-forming composition.

[0294] The primer layer-forming composition thus obtained was appliedonto a quartz glass substrate using a spin coater and dried at 150° C.for 10 minutes to form a transparent primer layer (thickness: 0.2 μm).

[0295] 30 g of isopropyl alcohol, 3 g of trimethoxymethylsilane (GEToshiba Silicones, TSL8113), and 20 g of inorganic coating forphotocatalyst ST-K03 (Ishihara Sangyo Kaisha, Ltd.) were mixed, andstirred at 100° C. for 20 minutes. The mixture was subjected to 3-folddilution with isopropyl alcohol to obtain a photocatalyst-containinglayer-forming composition.

[0296] The photocatalyst-containing layer-forming composition thusobtained was applied using a spin coater onto a quartz glass substrateon which a primer layer had been formed, and dried at 150° C. for 10minutes to obtain a transparent photocatalyst-containing layer(thickness: 0.15 μm).

[0297] 2. Formation of Decomposition-removable Layer

[0298] A Cationic Polymer Polydiallyldimethylammonium chloride (PDDA,mean molecular weight: 100,000 to 200,000, Aldrich) and an anionicpolymer polystyrene sodium sulfonate salt (PSS, mean molecular weight:70,000, Aldrich) were subjected to a layer-by-layer self-assembling on aglass substrate on which a light-shading layer had been formed to obtaina thickness of about 2 nm.

[0299] 3. Decomposition and Removal by Exposure

[0300] The photocatalyst-containing layer-sided substrate and adecomposition-removable layer were aligned to face each other at adistance of 50 μm, and exposed from the side of thedecomposition-removable layer with a very high pressure mercury lamp(wavelength: 365 nm) at 40 mW/cm² for 130 seconds to decompose andremove the decomposition-removable layer whereby forming a pixel-formingpart comprising the glass substrate which had come out.

[0301] In this procedure, the contact angles of the non-exposed part andthe pixel-forming part with the wettability index standard solutionwhose surface tension was 40 mN/m (JUNSEI CHEMICAL CO., LTD.) weremeasured using a contact angle meter (Kyowa Interface Science Co., LTD.,Model CA-Z) (30 seconds after dropwise addition from a microsyringe),and the results indicated that the contact angles were 30° and 6°,respectively.

What is claimed is:
 1. A method for producing a pattern-forming bodycomprising, placing a photocatalyst-containing layer-sided substratehaving a photocatalyst-containing layer containing a photocatalyst and asubstrate and a pattern-forming body substrate having acharacteristic-changeable layer whose characteristics are changed by theeffect of the photocatalyst in the photocatalyst-containing layer and alight-shading part formed as a pattern in such a manner that thephotocatalyst-containing layer and the characteristic-changeable layerare brought into contact with each other, followed by exposure on theside of the pattern-forming body substrate to change the characteristicsof the characteristic-changeable layer of the exposed part, followed byremoving the photocatalyst-containing layer-sided substrate wherebyobtaining a pattern-forming body having a pattern whose characteristicshave been changed on the characteristic-changeable layer.
 2. A methodfor producing a pattern-forming body comprising, placing aphotocatalyst-containing layer-sided substrate having aphotocatalyst-containing layer containing a photocatalyst and asubstrate and a pattern-forming body substrate having acharacteristic-changeable layer whose characteristics are changed by theeffect of the photocatalyst in the photocatalyst-containing layer and alight-shading part formed as a pattern in such a manner that thedistance between the photocatalyst-containing layer and thecharacteristic-changeable layer is 200 μm or less, followed by exposureon the side of the pattern-forming body substrate to change thecharacteristics of the characteristic-changeable layer of the exposedpart, followed by removing the photocatalyst-containing layer-sidedsubstrate whereby obtaining a pattern-forming body having a patternwhose characteristics have been changed on the characteristic-changeablelayer.
 3. A method for producing a pattern-forming body according toclaim 2, wherein the pattern-forming body substrate comprises atransparent substrate, a characteristic-changeable layer formed on thetransparent substrate and a light-shading part formed as a pattern.
 4. Amethod for producing a pattern-forming body according to claim 3,wherein the light-shading part has been formed as a pattern on thetransparent substrate, and is covered with the characteristic-changeablelayer formed thereon.
 5. A method for producing a pattern-forming bodyaccording to claim 2, wherein the photocatalyst-containing layer is alayer consisting of a photocatalyst.
 6. A method for producing apattern-forming body according to claim 5, wherein thephotocatalyst-containing layer is a layer obtained by forming a film ofa photocatalyst on a substrate by means of a vacuum film-forming method.7. A method for producing a pattern-forming body according to claim 2,wherein, the photocatalyst-containing layer is a layer having aphotocatalyst and a binder.
 8. A method for producing a pattern-formingbody according to claim 2, wherein, the photocatalyst is one or moresubstances selected from the group comprising titanium oxide (TiO₂),zincoxide (ZnO), tinoxide (SnO₂), strontium titanate (SrTiO₃), tungstenoxide (WO₃), bismuth oxide (Bi₂O₃), and iron oxide (Fe₂O₃).
 9. A methodfor producing a pattern-forming body according to claim 8, where in thephotocatalyst is titanium oxide (TiO₂).
 10. A method for producing apattern-forming body according to claim 2, wherein the exposure iseffected with heating the photocatalyst-containing layer.
 11. A methodfor producing a pattern-forming body according to claim 2, wherein thedistance between the photocatalyst-containing layer and thecharacteristic-changeable layer is within the range from 0.2 μm to 10 μmwhen the surface of the characteristic-changeable layer is faced to thephotocatalyst-containing layer to effect the exposure.
 12. A method forproducing a pattern-forming body according to claim 2, wherein thecharacteristic-changeable layer is a layer containing no photocatalyst.13. A method for producing a pattern-forming body according to claim 2,wherein the characteristic-changeable layer is a wettability-changeablelayer whose wettability is changed in such a manner that the contactangle with a liquid upon exposure is reduced by the effect of thephotocatalyst contained in the photocatalyst-containing layer.
 14. Amethod for producing a pattern-forming body according to claim 13,wherein the contact angle with a liquid whose surface tension is 40 mN/mon the wettability-changeable layer is 10° or more in a non-exposed partand 9° or less in an exposed part.
 15. A method for producing apattern-forming body according to claim 13, wherein thewettability-changeable layer is a layer containing anorganopolysiloxane.
 16. A method for producing a pattern-forming bodyaccording to claim 15, wherein the organopolysiloxane is a polysiloxanecontaining a fluoroalkyl group.
 17. A method for producing apattern-forming body according to claim 15, wherein theorganopolysiloxane is an organopolysiloxane which is a hydrolyticcondensate or a hydrolytic co-condensate of one or more siliconcompounds represented by Formula: Y_(n)SiZ_((4−n)), wherein Y denotes analkyl group, fluoroalkyl group, vinyl group, amino group, phenyl group,or epoxy group, X denotes an alkoxyl group or halogen, and n denotes aninteger of 0 to
 3. 18. A method for producing a pattern-forming bodyaccording to claim 13, wherein the pattern-forming body substrate has aself supporting wettability-changeable layer on whose surface alight-shading part formed as a pattern is provided.
 19. A method forproducing a pattern-forming body according to claim 2, wherein thecharacteristic-changeable layer is a decomposition-removable layer whichis decomposed and removed upon exposure by the effect of thephotocatalyst in the photocatalyst-containing layer.
 20. A method forproducing a pattern-forming body according to claim 19, wherein thecontact angle of a liquid with the decomposition-removable layer isdifferent from the contact angle of a liquid with the transparentsubstrate which comes out when the decomposition-removable layer isdecomposed and removed.
 21. A method for producing a pattern-formingbody according to claim 19, wherein the decomposition-removable layer iseither one of a self-assembled monolayer, Langmuir-Blodgett film orlayer-by-layer self-assembled film.
 22. A method for producing apattern-forming body according to claim 19, wherein the wettability onthe transparent substrate is 9° or less as a contact angle with a liquidwhose surface tension being 40 mN/m and that on thedecomposition-removable layer being 10° or more.
 23. A pattern-formingbody comprising, a transparent substrate, a characteristic-changeablelayer formed on the transparent substrate whose characteristics arechanged by the effect of a photocatalyst and a light-shading part formedas a pattern, and also comprising a pattern whose characteristics on thecharacteristic-changeable layer have been changed.
 24. A pattern-formingbody according to claim 23, wherein the light-shading part has beenformed as a pattern on the transparent substrate, and is covered withthe characteristic-changeable layer formed thereon.
 25. Apattern-forming body according to claim 23, wherein thecharacteristic-changeable layer is a wettability-changeable layer whosewettability is changed by the effect of the photocatalyst.
 26. Apattern-forming body according to claim 25, wherein the contact anglewith a liquid whose surface tension is 40 mN/m on thewettability-changeable layer is 10° or more in a non-exposed part and 9°or less in an exposed part.
 27. A pattern-forming body according toclaim 25, wherein the wettability-changeable layer is a layer containingan organopolysiloxane.
 28. A pattern-forming body according to claim 27,wherein the organopolysiloxane is a polysiloxane containing afluoroalkyl group.
 29. A pattern-forming body according to claim 27,wherein the organopolysiloxane is an organopolysiloxane which is ahydrolytic condensate or a hydrolytic co-condensate of one or moresilicon compounds represented by Formula: Y_(n)SiZ_((4−n)), wherein Ydenotes an alkyl group, fluoroalkyl group, vinyl group, amino group,phenyl group, or epoxy group, X denotes an alkoxyl group or halogen, andn denotes an integer of 0 to
 3. 30. A pattern-forming body comprising, aself supporting wettability-changeable layer and a light-shading partformed as a pattern on one side of the wettability-changeable layer andalso comprising, a pattern comprising a lyophilic region and a lyophobicregion on the other side of the wettability-changeable layer.
 31. Apattern-forming body according to claim 25, wherein thewettability-changeable layer is a layer containing no photocatalyst. 32.A pattern-forming body according to claim 23, wherein thecharacteristic-changeable layer is a decomposition-removable layer whichis decomposed and removed by the effect of the photocatalyst.
 33. Apattern-forming body according to claim 32, wherein the light-shadingpart has been formed as a pattern on the transparent substrate, and iscovered with the decomposition-removable layer.
 34. A pattern-formingbody according to claim 32, wherein the contact angle of a liquid withthe decomposition-removable layer is different from the contact angle ofa liquid with the transparent substrate which comes out when thedecomposition-removable layer is decomposed and removed.
 35. Apattern-forming body according to claim 32, wherein thedecomposition-removable layer is either one of a self-assembledmonolayer, Langmuir-Blodgett film, or layer-by-layer self-assembledfilm.
 36. A pattern-forming body according to claim 32, wherein thewettability on the transparent substrate is 9° or less as a contactangle with a liquid whose surface tension is 40 mN/m and the wettabilityon the decomposition-removable layer is 10° or more.
 37. A functionalelement comprising, a functional part positioned along the patternformed by the change in the characteristics in acharacteristic-changeable layer on a transparent substrate according toclaim
 23. 38. A functional element according to claim 37, wherein thefunctional part is a metal.
 39. A color filter comprising, a pixel partas a functional part of a functional element according to claim
 37. 40.A microlens comprising, a lens part as a functional part of a functionalelement according to claim 37.